CHARGED PARTICLE BEAM EQUIPMENT - SII NANOTECHNOLOGY INC

Title:

CHARGED PARTICLE BEAM EQUIPMENT

Document Type and Number:

WIPO Patent Application WO/2007/086254

Kind Code:

A1

Abstract:

Charged particle beam equipment capable of applying a high voltage to an electrostatic lens by preventing a very small amount of dust from depositing to an objective lens, i.e. the electrostatic lens. The charged particle beam equipment (1) comprises a chamber (2) having the interior (2a) which can be exhausted by an in-chamber exhaust means (4), and a body tube (3) for irradiating a sample (S) arranged in the interior (2a) of the chamber (2) with a charged particle beam (B1). The body tube (3) comprises a tube body (5) having an irradiation opening (6) for discharging the charged particle beam (B1), a charged particle supply section (7) housed on the proximal end (5c) side in the interior (5b) of the tube body (5) and discharging the charged particle beam (B1), and an objective lens (11) having an electrostatic lens housed on the distal end (5b) side in the interior (5b) of the tube body (5), and focusing the charged particle beam (B1) discharged from the charged particle supply section (7) by generating an electric field. The tube body (5) of the body tube (3) is provided, on the proximal end of the objective lens (11), with an air supply means (12) for supplying gas (G) to the interior (5b) of the tube body (5).

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Inventors:

OGAWA TAKASHI (JP)
MUTO HIROTO (JP)

Application Number:

PCT/JP2007/050190

Publication Date:

August 02, 2007

Filing Date:

January 11, 2007

Export Citation:

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Assignee:

SII NANOTECHNOLOGY INC (JP)
OGAWA TAKASHI (JP)
MUTO HIROTO (JP)

International Classes:

H01J37/16; H01J37/18

Domestic Patent References:

WO2002056332A1

2002-07-18

Foreign References:

JPH0963525A	1997-03-07
JPH06188182A	1994-07-08
JPS5823158U	1983-02-14
JP2004503063A	2004-01-29

Attorney, Agent or Firm:

MATSUSHITA, Yoshiharu (11-2 Hiroo 1-chome Shibuya-ku, Tokyo 12, JP)

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