Title:
CLEAN ROOM SYSTEM FOR SEMICONDUCTOR MANUFACTURING AND ELECTRIC-FIELD DUST REMOVAL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/216357
Kind Code:
A1
Abstract:
Provided are a clean room system (100) for semiconductor manufacturing and an electric-field dust removal method therefor. The clean room system (100) comprises a clean room (101) and an electric-field dust removal system (102); the clean room (101) comprises a gas inlet; the electric-field dust removal system (102) comprises a dust removal system outlet and an electric field apparatus (1021); the gas inlet of the clean room (101) communicates with the dust removal system outlet of the electric-field dust removal system (102); and the electric field apparatus (1021) comprises an electric field apparatus inlet (1011), an electric field apparatus outlet, an electric field cathode (10142) and an electric field anode (10141), the electric field cathode (10142) and the electric field anode (10141) are used to generate an ionizing electric field, and the length of the electric field anode (10141) is 10 mm-180 mm. The invention can effectively remove particles generated in the semiconductor manufacturing industry.
Inventors:
TANG WANFU (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
Application Number:
PCT/CN2020/086852
Publication Date:
October 29, 2020
Filing Date:
April 24, 2020
Export Citation:
Assignee:
SHANGHAI BIXIUFU ENTERPRISE MAN CO LTD (CN)
International Classes:
B03C3/40; B01D46/00; B03C3/02
Foreign References:
| JPH0498034A | 1992-03-30 | |||
| CN106504994A | 2017-03-15 | |||
| CN101376033A | 2009-03-04 | |||
| CN101920224A | 2010-12-22 | |||
| CN104127907A | 2014-11-05 | |||
| DE3310536A1 | 1984-09-27 |
Attorney, Agent or Firm:
SHANGHAI QIHE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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