COMPOUND, (CO)POLYMER, COMPOSITION, RESIST PATTERN FORMING METHOD, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER

Title:

COMPOUND, (CO)POLYMER, COMPOSITION, RESIST PATTERN FORMING METHOD, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER

Document Type and Number:

WIPO Patent Application WO/2021/230300

Kind Code:

A1

Abstract:

An iodine-containing (meth)acrylate compound which is represented by formula (1). In formula (1), R1 represents a hydrogen atom, a methyl group, or a halogen; each one of R2 moieties independently represents a hydrogen atom, a linear organic group having from 1 to 20 carbon atoms, a branched organic group having from 3 to 20 carbon atoms, or a cyclic organic group having from 3 to 20 carbon atoms; A represents an organic group having from 1 to 30 carbon atoms, and A contains at least one acyl group; n1 represents 0 or 1; and n2 represents an integer from 1 to 20.

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Inventors:

OMATSU TADASHI (JP)
MATSUMOTO MASAHIRO (JP)
YURI MICHIHIRO (JP)
KATAOKA KENTARO (JP)
SATO TAKASHI (JP)
ECHIGO MASATOSHI (JP)

Application Number:

PCT/JP2021/018110

Publication Date:

November 18, 2021

Filing Date:

May 12, 2021

Export Citation:

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Assignee:

MITSUBISHI GAS CHEMICAL CO (JP)

International Classes:

C08F20/26; C07C69/653; C08F8/12; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Domestic Patent References:

WO2020040161A1	2020-02-27
WO2020137935A1	2020-07-02
WO2021029396A1	2021-02-18

Foreign References:

US20180155472A1	2018-06-07
JP2015110532A	2015-06-18
CN105131161A	2015-12-09
JP2020106826A	2020-07-09