Title:
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND RESIN PURIFICATION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/230639
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a novel compound and the like that are useful for a lithography film forming material and the like. The purpose can be achieved by a compound represented by formula (1).
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Inventors:
HORIUCHI JUNYA (JP)
OKADA YU (JP)
MAKINOSHIMA TAKASHI (JP)
ECHIGO MASATOSHI (JP)
OKADA YU (JP)
MAKINOSHIMA TAKASHI (JP)
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2019/020864
Publication Date:
December 05, 2019
Filing Date:
May 27, 2019
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C39/15; C07C39/367; C07C49/83; C08G8/04; G03F7/11; G03F7/20; G03F7/26
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| WO2014185335A1 | 2014-11-20 | |||
| WO2015170524A1 | 2015-11-12 | |||
| WO2013024778A1 | 2013-02-21 | |||
| WO2013024779A1 | 2013-02-21 | |||
| WO2004066377A1 | 2004-08-05 | |||
| WO2018016614A1 | 2018-01-25 | |||
| WO2015080240A1 | 2015-06-04 |
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Other References:
NEMOTO, T. ET AL.: "Synthesis and properties of a High-Molecular-Weight Organosoluble Bisphenol A novolac", POLYMER JOURNAL, vol. 41, no. 4, 2009, pages 338 - 342, XP055662407, DOI: 10.1295/polymj.PJ2008199
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SHINJI OKAZAKI ET AL.: "New Trends of Photoresists", September 2009, CMC PUBLISHING CO., LTD., pages: 211 - 259
See also references of EP 3805191A4
T. NAKAYAMAM. NOMURAK. HAGAM. UEDA, BULL. CHEM. SOC. JPN., vol. 71, 1998, pages 2979
SHINJI OKAZAKI ET AL.: "New Trends of Photoresists", September 2009, CMC PUBLISHING CO., LTD., pages: 211 - 259
See also references of EP 3805191A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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