Title:
CURED FILM-FORMING COMPOSITION, ALIGNMENT MATERIAL, AND RETARDATION MATERIAL
Document Type and Number:
WIPO Patent Application WO/2023/204280
Kind Code:
A1
Abstract:
[Problem] To provide a cured film-forming composition capable of forming a cured film having excellent liquid crystal alignment and adhesion properties by firing at a low temperature of less than 100°C, and an alignment material and a retardation material formed by using a cured film obtained from the cured film-forming composition. [Solution] A cured film-forming composition that comprises: (A) a low molecular weight compound having a photoalignment group and a thermal crosslinking group; (B) a crosslinking agent having an N-hydroxymethyl group or an N-alkoxymethyl group; (C) a polymer having 60 mol% or more, relative to the total repeating units, of a repeating unit having a hydroxy group; (D) a polymer having 45 mol% or more, relative to the total repeating units, of a repeating unit represented by formula (X) and also having a repeating unit having a hydroxy group; (E) a compound having a polymerizable group and a hydroxy group; and (F) a cross-linking catalyst. (In the formula: R1 represents a hydrogen atom or a methyl group; and R2 represents a linear or branched alkyl group having 1-5 carbon atoms.)
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Inventors:
SUZUKI TOMOYA (JP)
NISHIMURA NAOYA (JP)
NISHIMURA NAOYA (JP)
Application Number:
PCT/JP2023/015831
Publication Date:
October 26, 2023
Filing Date:
April 20, 2023
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08L101/06; C08F291/06; C08L33/14; C08L33/26; G02B5/30; G02F1/13363; G02F1/1337
Domestic Patent References:
| WO2013054784A1 | 2013-04-18 | |||
| WO2014065324A1 | 2014-05-01 | |||
| WO2019189193A1 | 2019-10-03 | |||
| WO2014010688A1 | 2014-01-16 | |||
| WO2014073658A1 | 2014-05-15 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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