Title:
EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/081234
Kind Code:
A1
Abstract:
An exposure apparatus (100) is provided with: an illuminating optical apparatus (10), which illuminates a mask (M) with an exposure beam (IL); a mask table (MTB), which holds the circumference of a pattern region of the mask from above such that the pattern surface of the mask is substantially parallel to the XY plane, and which makes a force within the surface parallel to at least the XY plane operate to the mask; and a wafer stage (WST), which holds a wafer (W) substantially parallel to the XY plane, and moves along the XY plane. Consequently, even though the exposure apparatus is employing a proximity system, namely, not using a projection optical system, a mask pattern and a base pattern on a substrate can be highly accurately superimposed onto each other.
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Inventors:
SHIBAZAKI YUICHI (JP)
Application Number:
PCT/JP2011/006951
Publication Date:
June 21, 2012
Filing Date:
December 13, 2011
Export Citation:
Assignee:
NIKON CORP (JP)
SHIBAZAKI YUICHI (JP)
SHIBAZAKI YUICHI (JP)
International Classes:
H01L21/027; G03F7/20
Foreign References:
| JP2010266561A | 2010-11-25 | |||
| JPH05190415A | 1993-07-30 | |||
| JP2010250239A | 2010-11-04 | |||
| JP2003295102A | 2003-10-15 |
Attorney, Agent or Firm:
TATEISHI, Atsuji (JP)
Tokuji Tateishi (JP)
Tokuji Tateishi (JP)
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Claims: