Title:
EXPOSURE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2004/006310
Kind Code:
A1
Abstract:
An exposure system which uses an optical system comprising optical elements having a magnesium fluoride film having an atomic ratio of magnesium : fluoride = 1.00 : 1.99 to 2.01. The magnesium fluoride film has an almost stoichiometric chemical composition and thus is almost free of the loss of fluorine, resulting in the suppression of the absorption of light caused by the loss of fluorine, which leads to the securement of a sufficient quantity of light for exposing a photosensitive substrate. The exposure system comprises optical elements having a magnesium fluoride thin film improved in the transmittance of a vacuum ultraviolet light.
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Inventors:
TAKI YUSUKE (JP)
Application Number:
PCT/JP2003/008704
Publication Date:
January 15, 2004
Filing Date:
July 09, 2003
Export Citation:
Assignee:
NIKON CORP (JP)
TAKI YUSUKE (JP)
TAKI YUSUKE (JP)
International Classes:
G03F7/20; G03F1/00; (IPC1-7): H01L21/027; G02B1/10; G03F7/20
Domestic Patent References:
| WO2000058761A1 | 2000-10-05 |
Foreign References:
| JP2001264512A | 2001-09-26 | |||
| JP2003113464A | 2003-04-18 | |||
| EP1312586A1 | 2003-05-21 |
Attorney, Agent or Firm:
Kawakita, Kijuro (1-15 Shinjuku 5-chom, Shinjuku-ku Tokyo, JP)
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