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Patent Searching and Data


Title:
FILM-FORMING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/056133
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a film-forming device capable of preventing oxidation of a heat generating body at the time of forming a gas barrier film by means of a catalytic chemical vapor deposition (Cat-CVD) method. In a film-forming device 1 of the present invention, a gas supply tube 20 is provided with: a first supply tube 21, which advances and retracts in a film-forming chamber 11, has a first gas flow channel 26 inside, and discharges a medium gas G toward a heat generating body 31 from a leading end; and a second supply tube 23, which has inside a second gas flow channel 27 in communication with the first gas flow channel 26, and which is connected to the first supply tube 21. The film-forming device 1 is provided with: a first cylinder 41, in which the first supply tube 21 ascends and descends, and which has a depressurization chamber 43 in communication with the first gas flow channel 26; and a second cylinder 45, in which the second supply tube 23 ascends and descends, and which has a storage chamber 47 in communication with the second gas flow channel 27. The medium gas G supplied to the storage chamber 47 passes through the second supply tube 23 and the first supply tube 21 in this order, and is supplied to a container P.

Inventors:
MIZUKAWA KENJI (JP)
HIROYA KIYOSHI (JP)
NAKANISHI FUMIKAZU (JP)
Application Number:
PCT/JP2015/005018
Publication Date:
April 06, 2017
Filing Date:
October 01, 2015
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND FOOD & PACKAGING MACHINERY CO LTD (JP)
International Classes:
C23C16/455; B65D23/02
Domestic Patent References:
WO2013099960A12013-07-04
Foreign References:
JP2013133494A2013-07-08
JP2013534565A2013-09-05
Other References:
See also references of EP 3358040A4
Attorney, Agent or Firm:
OBA, Mitsuru et al. (JP)
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