Title:
GLASS SUBSTRATE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2019/146379
Kind Code:
A1
Abstract:
The present invention addresses the technical problem of providing: a glass substrate which, because of having a small heat shrinkage rate, is suitable for a high-definition display substrate and which is unlikely to induce charge detachment; and a method for manufacturing such a glass substrate. The glass substrate according to the present invention is characterized by comprising, by mass percentage, 50-70% of SiO2, 10-25% of Al2O3, at least 0% but less than 3% of B2O3, 0-10% of MgO, 0-15% of CaO, 0-10% of SrO, 0-15% of BaO, and 0.005-0.3% of Na2O, and having a β-OH value of less than 0.18/mm and a strain point of at least 735°C.
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Inventors:
UMEMURA HIROMICHI (JP)
Application Number:
PCT/JP2018/048458
Publication Date:
August 01, 2019
Filing Date:
December 28, 2018
Export Citation:
Assignee:
NIPPON ELECTRIC GLASS CO (JP)
International Classes:
C03C3/091; C03B25/04; C03C15/00; C03C19/00
Domestic Patent References:
| WO2016194693A1 | 2016-12-08 | |||
| WO2016185976A1 | 2016-11-24 | |||
| WO2017122576A1 | 2017-07-20 |
Foreign References:
| JP2005255478A | 2005-09-22 | |||
| JP2015013800A | 2015-01-22 |
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