Title:
HOT ELECTRON TRANSISTOR
Document Type and Number:
WIPO Patent Application WO/2007/058144
Kind Code:
A1
Abstract:
It is possible reduce a charging time by increasing the maximum current density
of emitter current and obtain a higher-speed operation of a hot electron transistor.
The hot electron transistor comprises: an emitter electrode and an emitter layer;
a collector electrode and a collector layer; an active layer formed of an intrinsic
semiconductor in the traveling path of conduction electrons between the emitter
layer and the collector layer; and a gate electrode installed on the active layer.
The emitter layer is formed of a material having higher conduction band bottom
energy than a material forming the active layer.
More Like This:
Inventors:
MIYAMOTO YASUYUKI (JP)
FURUYA KAZUHITO (JP)
ASADA MASAHIRO (JP)
MACHIDA NOBUYA (JP)
FURUYA KAZUHITO (JP)
ASADA MASAHIRO (JP)
MACHIDA NOBUYA (JP)
Application Number:
PCT/JP2006/322562
Publication Date:
May 24, 2007
Filing Date:
November 13, 2006
Export Citation:
Assignee:
TOKYO INST TECH (JP)
MIYAMOTO YASUYUKI (JP)
FURUYA KAZUHITO (JP)
ASADA MASAHIRO (JP)
MACHIDA NOBUYA (JP)
MIYAMOTO YASUYUKI (JP)
FURUYA KAZUHITO (JP)
ASADA MASAHIRO (JP)
MACHIDA NOBUYA (JP)
International Classes:
H01L29/68; H01L21/331; H01L29/737
Foreign References:
JPH01244662A | 1989-09-29 | |||
JPS6236862A | 1987-02-17 | |||
JPH02266529A | 1990-10-31 |
Attorney, Agent or Firm:
FURUYA, Fumio et al. (19-5 Nishishinjuku 1-chome, Shinjuku-k, Tokyo 23, JP)
Download PDF:
Previous Patent: PRINTING APPARATUS AND ITS CLEANING MECHANISM
Next Patent: PROCESS FOR PRODUCING GLASS
Next Patent: PROCESS FOR PRODUCING GLASS