Title:
INSPECTION SYSTEM, INSPECTION METHOD, AND PROGRAM
Document Type and Number:
WIPO Patent Application WO/2020/110711
Kind Code:
A1
Abstract:
This inspection system comprises: an optical system having a variable focal point; an imaging element for generating an image due to reception of light from an object through the optical system; a focus adjustment unit for adjusting a focal point; an inspection unit for inspecting the object on the basis of a first region in an inspection image generated when a focal point is adjusted by the focus adjustment unit, and outputting the inspection results; and an assessment unit for assessing the reliability of focus on a site subject to inspection in the object on the basis of a second region in the inspection image, and outputting the assessment results. Accordingly, the risk of overlooking a defect in an object can be reduced.
Inventors:
YAMAUCHI YUJI (JP)
KATO YUTAKA (JP)
KATO YUTAKA (JP)
Application Number:
PCT/JP2019/044387
Publication Date:
June 04, 2020
Filing Date:
November 12, 2019
Export Citation:
Assignee:
OMRON TATEISI ELECTRONICS CO (JP)
International Classes:
G03B15/00; G01N21/88; G02B7/28; G02B7/36; G03B13/36; H04N5/232
Domestic Patent References:
| WO2012144025A1 | 2012-10-26 |
Foreign References:
| JP2000180380A | 2000-06-30 | |||
| JP2004038884A | 2004-02-05 | |||
| JP2017107201A | 2017-06-15 | |||
| JPH07306009A | 1995-11-21 | |||
| JP2012202714A | 2012-10-22 |
Attorney, Agent or Firm:
FUKAMI PATENT OFFICE, P.C. (JP)
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