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Title:
LAMINATE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/210154
Kind Code:
A1
Abstract:
Provided is a laminate that can be implemented with a wide processing margin and without adhesive residue or damage to a semiconductor element in the transfer of the semiconductor element using laser light of various wavelengths. The laminate is obtained by laminating a substrate 1 having laser permeability, a resin film 1 and a resin film 2 in this order, wherein the light absorbance of the resin film 1 calculated for a film thickness of 1.0 μm at any wavelength of 200 nm to 1100 nm is 0.4-5.0, and the adhesive strength of the surface of the resin film 2 on the side opposite that of the resin film 1 side is 0.02-0.3 N/cm.

Inventors:
NAKAJIMA RISANO (JP)
ARIMOTO YUKARI (JP)
KOSHINO MIKA (JP)
ARAKI HITOSHI (JP)
TOMIKAWA MASAO (JP)
FUJIWARA TAKENORI (JP)
AOSHIMA KENTA (JP)
Application Number:
PCT/JP2022/013453
Publication Date:
October 06, 2022
Filing Date:
March 23, 2022
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
International Classes:
B32B27/00; B32B7/023; C08G73/10
Domestic Patent References:
WO2020189273A12020-09-24
WO2020080276A12020-04-23
WO2014050820A12014-04-03
WO2019207920A12019-10-31
WO2016152906A12016-09-29
WO2016167296A12016-10-20
WO2017170021A12017-10-05
Foreign References:
JP2020149985A2020-09-17
JP2014515883A2014-07-03
US20200234993A12020-07-23
US9650723B12017-05-16
JP2017531915W
JP2020129638A2020-08-27
JP2020188037A2020-11-19
JP2010251359A2010-11-04
JP2014515883W
JP3120476B22000-12-25
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