Title:
LASER DEVICE AND LASER ANNEAL DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/047220
Kind Code:
A1
Abstract:
A laser device for laser annealing is provided with: A) a laser oscillator that outputs pulsed laser light; and B) an OPS device which is disposed on the optical path of the pulsed laser light output from the laser oscillator, and which includes at least one OPS for stretching the pulse time width of the incident pulsed laser light, wherein, among the OPSs, a first OPS of which a delay optical path length L that is the length of a delay optical path becomes the smallest has a delay optical path length L(1) which is in the range of the following expression (A).
ΔT75% × c ≤ L(1) ≤ ΔT25% × c Expression (A)
where ΔTa% is the time full-width of the position at which the optical intensity exhibits the value of a% with respect to a peak value in the input waveform of pulsed laser light that is output from the laser oscillator and that becomes incident on the OPS device, and c is the speed of light.
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Inventors:
TANAKA SATOSHI (JP)
WAKABAYASHI OSAMU (JP)
WAKABAYASHI OSAMU (JP)
Application Number:
PCT/JP2016/076103
Publication Date:
March 15, 2018
Filing Date:
September 06, 2016
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H01L21/268
Domestic Patent References:
| WO2014156818A1 | 2014-10-02 |
Foreign References:
| JP2008546188A | 2008-12-18 | |||
| US20120260847A1 | 2012-10-18 | |||
| JP2014525141A | 2014-09-25 |
Attorney, Agent or Firm:
KYORITSU INSTITUTE (JP)
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