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Patent Searching and Data


Title:
LIQUID SUPPLY SYSTEM, LIQUID CIRCULATION METHOD, AND PRINTING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2022/118699
Kind Code:
A1
Abstract:
Provided are a liquid supply system, a liquid circulation method and a printing system in which the generation of distribution of liquid contained in a buffer tank can be suppressed. The liquid supply system comprises: a buffer tank (12) in which the liquid to be supplied to a liquid supply target device (15) is stored; liquid level changing devices (78, 82) that change the liquid level in the buffer tank; liquid flow paths (16, 18) that communicate the liquid supply target device and the buffer tank; a pump (98A) provided in the liquid flow path; and a valve (97A) that opens and closes the liquid flow path, wherein when the liquid supply target device does not operate, the liquid is discharged from the buffer tank to lower the liquid level in the buffer tank, and the pump and the valve are controlled to allow the liquid to flow from the liquid flow path to the buffer tank.

Inventors:
KYOSO TADASHI (JP)
Application Number:
PCT/JP2021/042887
Publication Date:
June 09, 2022
Filing Date:
November 24, 2021
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B41J2/18; B41J2/01; B41J2/175
Domestic Patent References:
WO2020134055A12020-07-02
Foreign References:
JP2010184384A2010-08-26
JP2020116813A2020-08-06
JP2017052099A2017-03-16
JP2014180829A2014-09-29
JP2021112825A2021-08-05
JP2015128850A2015-07-16
JP2017119355A2017-07-06
JP2010083021A2010-04-15
JP2010099855A2010-05-06
JP2002273867A2002-09-25
JP2015071263A2015-04-16
Attorney, Agent or Firm:
MATSUURA, Kenzo (JP)
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