Title:
MEASUREMENT PATTERN AND PREPARATION METHOD THEREFOR, MEASUREMENT METHOD AND APPARATUS, AND DEVICE AND MEDIUM
Document Type and Number:
WIPO Patent Application WO/2024/000636
Kind Code:
A1
Abstract:
A measurement pattern and a preparation method therefor, a measurement method and apparatus, and a device and a medium. The measurement pattern comprises a body layer, which comprises an array region (202), which is located in the middle of the body layer, and a peripheral region (201) surrounding the array region, wherein an orthographic projection of the peripheral region (201) on the upper surface of a wafer comprises a continuous closed pattern surrounding the array region (202), and the peripheral region (201) has standard parameters, which comprise preset zero-value offset data; and the array region (202) comprises first mark units (111) distributed in an array, the first mark units (111) have preset parameters, which comprise an etching calibration quantity equation and preset etching offsets for corresponding positions in the array region on the wafer, and different first mark units (111) correspond to different positions in the array region of the wafer, which etching calibration quantity equation is associated with at least some of the preset etch offsets in the preset parameters. The solution at least can effectively prevent an optical proximity effect during the process of performing measurement by using a measurement pattern, and reduce the degree of difference between a pattern structure in acquired pattern data and an expected structure.
Inventors:
QIU SHAOWEN (CN)
Application Number:
PCT/CN2022/104883
Publication Date:
January 04, 2024
Filing Date:
July 11, 2022
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F7/20
Foreign References:
| CN104216234A | 2014-12-17 | |||
| CN1673871A | 2005-09-28 | |||
| CN111796489A | 2020-10-20 | |||
| CN111948901A | 2020-11-17 | |||
| CN112542396A | 2021-03-23 | |||
| CN112180688A | 2021-01-05 | |||
| CN105319865A | 2016-02-10 | |||
| CN102722082A | 2012-10-10 | |||
| US20190027386A1 | 2019-01-24 |
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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