Title:
METHOD FOR FILTERING POLISHING-ADDITIVE-CONTAINING LIQUID, POLISHING-ADDITIVE-CONTAINING LIQUID, POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND FILTER
Document Type and Number:
WIPO Patent Application WO/2021/024899
Kind Code:
A1
Abstract:
Provided is a method for filtering a polishing-additive-containing liquid with which it is possible to implement a polishing composition that shows exceptional defect reduction performance while maintaining a practical filter life. The method for filtering a polishing-additive-containing liquid provided by the present invention includes a step for filtering the polishing-additive-containing liquid using a filter that satisfies the following conditions (1) and (2). (1) The average pore diameter P measured by a palm porometer is 0.15 μm or less. (2) The pore diameter gradient (Sin/Sout), which is the ratio of an inlet-side average pore diameter Sin and an outlet-side average pore diameter Sout measured by SEM observation, is 3 or less.
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Inventors:
FURUTA SHINJI (JP)
HAYAKAWA TAKASHI (JP)
ASHITAKA KEIJI (JP)
MIWA NAOYA (JP)
TSUCHIYA KOHSUKE (JP)
TANSHO HISANORI (JP)
AKIZUKI REIKO (JP)
HAYAKAWA TAKASHI (JP)
ASHITAKA KEIJI (JP)
MIWA NAOYA (JP)
TSUCHIYA KOHSUKE (JP)
TANSHO HISANORI (JP)
AKIZUKI REIKO (JP)
Application Number:
PCT/JP2020/029203
Publication Date:
February 11, 2021
Filing Date:
July 30, 2020
Export Citation:
Assignee:
FUJIMI INC (JP)
International Classes:
B24B57/02; B24B37/00; C09G1/02; H01L21/304
Domestic Patent References:
| WO2011108418A1 | 2011-09-09 |
Foreign References:
| JP2016089297A | 2016-05-23 | |||
| JP2014173013A | 2014-09-22 | |||
| JP2012044056A | 2012-03-01 | |||
| JP2019146778A | 2019-09-05 | |||
| JPH11302633A | 1999-11-02 | |||
| JP2017075316A | 2017-04-20 |
Other References:
See also references of EP 4011552A4
Attorney, Agent or Firm:
ABE, Makoto (JP)
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