METHOD FOR MANUFACTURING PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY

WIPO Patent Application WO/2023/249314

A1

The present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. The present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. More specifically, the present invention relates to a method for manufacturing a pellicle for extreme ultraviolet lithography by using a solid-state reaction between a metal layer and a silicon-based material layer. The present invention provides a method for manufacturing a pellicle for extreme ultraviolet lithography, comprising the steps of: a) forming, on a substrate, a stack obtained by sequentially stacking a first silicon-based material layer, a metal layer, and a second silicon-based material layer; and b) inducing an interlayer solid-state reaction so that the layers constituting the stack react to form a multi-component compound. According to the method for manufacturing a pellicle for extreme ultraviolet lithography, in the present invention, a multi-component compound is formed through diffusion between a metal layer and a silicon-based material layer, and thus the mechanical strength of a pellicle film is improved. In addition, improvements in thermal stability and transmittance can also be expected.

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WO/2019/050288	PELLICLE FRAME

PARK JIN SU (KR)
KIM KYOUNG SOO (KR)
YU LAN (KR)
KIM CHEONG (KR)
HONH SEONG GYU (KR)
SEO KYOUNG WON (KR)
PARK SEONG HWAN (KR)
CHO SANG JIN (KR)
LEE SO YOON (KR)
BAE JUNG JUN (KR)
KIM YONG SU (KR)
KANG HONG GU (KR)
PARK JUN WOO (KR)
YU JUN SEONG (KR)
YUN WOO HYUN (KR)
CHOI JAE HYUCK (KR)

PCT/KR2023/008198

December 28, 2023

June 14, 2023

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FINE SEMITECH CORP (KR)

G03F1/62; G03F1/22

JP2021056484A	2021-04-08
KR20220017132A	2022-02-11
KR20200077527A	2020-06-30
KR20220006887A	2022-01-18
KR20180135490A	2018-12-20

DYNE PATENT & LAW FIRM (KR)

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