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Title:
METHOD FOR REMOVING PHOTORESIST
Document Type and Number:
WIPO Patent Application WO/2015/172510
Kind Code:
A1
Abstract:
A method for removing a photoresist, comprising: an oxide thin film (13) is deposited on a substrate (10) formed with a photoresist (12); the oxide thin film (13) is treated with ultraviolet light; the oxide thin film (13) is stripped off; the photoresist (12) is removed. The present method solves the problem that the photoresist (12) cannot be completely removed.

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Inventors:
TIAN HUI (CN)
Application Number:
PCT/CN2014/088766
Publication Date:
November 19, 2015
Filing Date:
October 16, 2014
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
International Classes:
G03F7/42
Foreign References:
CN103969966A2014-08-06
CN1481519A2004-03-10
CN101324404A2008-12-17
CN101852994A2010-10-06
KR20090025689A2009-03-11
JP2008103431A2008-05-01
Attorney, Agent or Firm:
LIU, SHEN & ASSOCIATES (CN)
北京市柳沈律师事务所 (CN)
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