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Title:
MULTI-CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/058290
Kind Code:
A1
Abstract:
A multi-charged particle beam drawing apparatus (100) according to one aspect of the present invention comprises: a distribution ratio calculation circuit (58) that calculates, for each design grid and each combination of a plurality of combinations of beams, a dose distribution ratio for each beam of two or more beams forming the combination to distribute the amount of dose to be applied to the design grid to the two or more beams forming the combination such that the total sum of the distributed dose amounts after the distribution is equivalent to the amount of dose to be applied to the design grid; a combination selection circuit (62) that selects, for each design grid, such a combination that the dose distribution ratio of a first beam having the shortest distance from the design grid to the actual irradiation position is larger than the dose distribution ratio of the remaining one or more beams of the two or more beams forming the combination; and a dose correction circuit (70) that corrects the dose amount at each design irradiation position of a beam by adding, thereto, the dose amount distributed to this irradiation position according to the dose distribution ratios for the two or more beams forming the combination selected for each design grid in the entire beam array of the multi-charged particle beams, and outputs this corrected dose amount.

Inventors:
KATO YASUO (JP)
KAWANA RYOH (JP)
HAYAMI MASAO (JP)
Application Number:
PCT/JP2022/027527
Publication Date:
April 13, 2023
Filing Date:
July 13, 2022
Export Citation:
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Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/305; G03F7/20; H01L21/027
Foreign References:
JP2019029575A2019-02-21
JP2019033117A2019-02-28
JP2021015881A2021-02-12
JP2019212869A2019-12-12
JP2015228501A2015-12-17
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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