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Patent Searching and Data


Title:
OPTICAL ANALYZING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/120951
Kind Code:
A1
Abstract:
In order to include a plurality of samples in an imaging field of view in an SPR imaging device for analyzing a plurality of samples, there has been a need to prepare an optical system with a large aperture. As a result, the number of samples that could be analyzed at one time has been limited. Thus, it has been difficult to improve the throughput when analyzing a plurality of samples. This optical analyzing device is provided with a light source, a detector, a substrate having a metal film on at least one surface thereof, and an optical element for introducing a light beam from the light source to the substrate and delivering the light beam from the substrate toward the detector. A plurality of sample regions for holding samples are provided on the metal film; and a portion of the light beam from the light source is irradiated to any one of the sample regions, is reflected, at least once, by the surface of the substrate on the opposite side of the side on which the sample regions are provided, and is not irradiated to a sample region other than the aforementioned sample region in the path thereof until the portion of the light beam is delivered by the optical element.

Inventors:
OBARA TAKAYUKI (JP)
MAESHIMA MUNEO (JP)
IMAI KAZUMICHI (JP)
HANAZAKI YOHEI (JP)
Application Number:
PCT/JP2015/051955
Publication Date:
August 04, 2016
Filing Date:
January 26, 2015
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01N21/41
Foreign References:
JP2002536638A2002-10-29
JP2008083036A2008-04-10
JP2009139279A2009-06-25
JPH0217431A1990-01-22
JP2003524179A2003-08-12
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
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