PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS AND PATTERN FORMING PROCESS

WIPO Patent Application WO/2007/032195

A1

The invention aims at providing a pattern forming material which little suffers from area defects, fog caused by a color developer, and break of unexposed film and exhibits high resolution, high tent film strength, and excellent removability after pattern formation and which can form finer patterns; a pattern forming apparatus provided with the material; and a pattern forming process by use of the material. The invention provides a pattern forming material having a photosensitive layer which comprises a binder, a polymerizable compound, a photopolymerization initiator, a fused heterocyclic compound, a polymerization inhibitor, a color developer and an organic solvent, wherein the binder has an acid value of 50 to 400mgKOH/g and a mass-average molecular weight of 10,000 to 100,000; the polymerizable compound is a compound having a urethane group and/or a compound having an aryl group; and the organic solvent is at least one member selected from among ketones, alcohols and ethers with the content thereof being 0.5% by mass or below.

MINAMI KAZUMORI (JP)
SATO MORIMASA (JP)

PCT/JP2006/316694

March 22, 2007

August 25, 2006

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FUJIFILM CORP (JP)
MINAMI KAZUMORI (JP)
SATO MORIMASA (JP)

G03F7/004; C08F299/00; G03F7/027; G03F7/033; G03F7/20; H01L21/027

JP2004317851A	2004-11-11
JP2001318461A	2001-11-16
JP2003057812A	2003-02-28
JP2005070175A	2005-03-17
JP2004004528A	2004-01-08
JPH05241340A	1993-09-21
JP2004335639A	2004-11-25
JP2004335692A	2004-11-25

HIROTA, Koichi et al. (NAGARE & ASSOCIATES 4th Floor, Shinjuku TR Bldg., 2-2-13, Yoyog, Shibuya-ku Tokyo 53, JP)

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