Title:
PELLICLE, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE DEVICE, METHOD FOR PRODUCING PELLICLE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/030498
Kind Code:
A1
Abstract:
A pellicle (10) which comprises a pellicle film (12) that comprises a carbon-based film having a carbon content of 40% by mass or more and a support frame (14) that supports the pellicle film in such a manner that the pellicle film and the support frame are in contact with each other, and which satisfies at least one of the condition 1 and the condition 2 described below. (Condition 1) A surface of the support frame, said surface being in contact with the pellicle film, has a roughness Ra of 1.0 μm or less. (Condition 2) The edge part of the support frame, said edge part being on the surface that is in contact with the pellicle film, while being positioned inside the pellicle, has a roughness depth of 10 μm or less.
Inventors:
ONO YOUSUKE (JP)
Application Number:
PCT/JP2021/028798
Publication Date:
February 10, 2022
Filing Date:
August 03, 2021
Export Citation:
Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
C23C28/00; C23C26/00; G03F1/64; G03F7/20
Domestic Patent References:
| WO2006011655A1 | 2006-02-02 |
Foreign References:
| JP2019174628A | 2019-10-10 | |||
| JP2019168502A | 2019-10-03 | |||
| JPH11167198A | 1999-06-22 | |||
| JP2006184704A | 2006-07-13 | |||
| JP2017076024A | 2017-04-20 | |||
| JPH02168613A | 1990-06-28 | |||
| JPH11167198A | 1999-06-22 | |||
| JP2006184704A | 2006-07-13 | |||
| JP2012159671A | 2012-08-23 | |||
| JP2007005661A | 2007-01-11 | |||
| JP2015178250A | 2015-10-08 | |||
| JP2020133262A | 2020-08-31 |
Other References:
SAITO ET AL., J. NANOSCI. NANOTECHNOL., vol. 8, 2008, pages 6153 - 6157
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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