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Title:
PELLICLE, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE DEVICE, METHOD FOR PRODUCING PELLICLE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/030499
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a pellicle which is capable of suppressing deterioration of a pellicle film; and an original plate for light exposure.　This pellicle comprises a pellicle film (12) which comprises a carbon-based film having a carbon content of 40% by mass or more, a support frame (14) which supports the pellicle film (12), and an adhesive layer (15) which contains an adhesive, wherein the total amount of aqueous outgases is 5.0 × 10-4 Pa·L/sec or less in an atmosphere at 23°C at 1 × 10-3 Pa or less.

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Inventors:
ONO YOUSUKE (JP)
OKUBO ATSUSHI (JP)
KOHMURA KAZUO (JP)
Application Number:
PCT/JP2021/028799
Publication Date:
February 10, 2022
Filing Date:
August 03, 2021
Export Citation:
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Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
G03F1/62; C01B32/159; C01B32/168; C01B32/17; C01B32/174
Domestic Patent References:
WO2020008977A12020-01-09
WO2018151056A12018-08-23
WO2019172141A12019-09-12
WO2020008976A12020-01-09
WO2018151056A12018-08-23
WO2006011655A12006-02-02
Foreign References:
JP2013195950A2013-09-30
JP2006091667A2006-04-06
JP2001312048A2001-11-09
JPH11295880A1999-10-29
JP2011203568A2011-10-13
JP2020091310A2020-06-11
JP2012162437A2012-08-30
JP2015200868A2015-11-12
JP2020091310A2020-06-11
JP2015178250W
JP2020134100A2020-08-31
Other References:
SAITO ET AL., J. NANOSCI. NANOTECHNOL, vol. 8, 2008, pages 6153 - 6157
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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