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Patent Searching and Data


Title:
PHOTOMULTIPLIER
Document Type and Number:
WIPO Patent Application WO/2002/067287
Kind Code:
A1
Abstract:
A photomultiplier cuts out light reflection from each focusing piece or unuseful electrons from being emitted from photoelectronic face by forming an oxide film over the surface of each focusing piece of a focusing electrode. The oxide film is formed over the surface of each secondary electron emission piece of the first and second stage die node to cut out the reflection from each secondary electron emission piece, so that unuseful electrons by reflected light are prevented from being emitted from the photoelectron face. Further, a light absorbing glass partition is provided in a light receiving face plate to suppress crosstalks between channels.

Inventors:
KATO HISAKI (JP)
KAWAI HIDETO (JP)
Application Number:
PCT/JP2002/001625
Publication Date:
August 29, 2002
Filing Date:
February 22, 2002
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS KK (JP)
KATO HISAKI (JP)
KAWAI HIDETO (JP)
International Classes:
H01J43/04; H01J43/06; H01J43/18; H01J43/22; H01J43/28; (IPC1-7): H01J43/28
Foreign References:
JP2000149863A2000-05-30
JPH11345587A1999-12-14
JPH05290793A1993-11-05
JPS61273826A1986-12-04
JPS55146854A1980-11-15
Other References:
See also references of EP 1369899A4
Attorney, Agent or Firm:
Koizumi, Shin (Yushima 3-chome Bunkyo-ku, Tokyo, JP)
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