Title:
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, METHOD FOR PRODUCING CIRCUIT WIRING, AND METHOD FOR PRODUCING TOUCH PANEL
Document Type and Number:
WIPO Patent Application WO/2019/022089
Kind Code:
A1
Abstract:
Provided is a photosensitive resin composition comprising: a polymer containing a constituent unit having a group in which a carboxylic acid group is protected in the form of acetal; a photo-acid-generating agent that is at least one selected from the group consisting of an oxime compound and an onium salt compound; and a latent pigment having a wavelength range at the time of color development of 400 to 780 nm, and a maximum absorption wavelength of at least 500 nm. Also provided are: a photosensitive transfer material including said photosensitive resin composition; a method for producing a circuit wiring using said photosensitive transfer material; and a method for producing a touch panel.
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Inventors:
GOTO HIDENORI (JP)
YAMADA SATORU (JP)
YAMADA SATORU (JP)
Application Number:
PCT/JP2018/027762
Publication Date:
January 31, 2019
Filing Date:
July 24, 2018
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C08F20/28; G03F7/039; G06F3/041
Foreign References:
| JP2002091004A | 2002-03-27 | |||
| JP2002214771A | 2002-07-31 | |||
| JP2004326094A | 2004-11-18 | |||
| JP2006220863A | 2006-08-24 | |||
| JP2006292957A | 2006-10-26 | |||
| JP2004361557A | 2004-12-24 | |||
| JP2008122501A | 2008-05-29 | |||
| JP2010237310A | 2010-10-21 | |||
| JP2000284473A | 2000-10-13 | |||
| JP2002240441A | 2002-08-28 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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