Title:
PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/048419
Kind Code:
A1
Abstract:
A plasma treatment method for using a plasma treatment device is used, the method comprising: a step for acquiring parameters including a first initial electric-power value, an initial electric-power application time, and an output inhibition ratio; a step for acquiring a treatment recipe including a recipe-set electric-power value as a second initial electric-power value; a step for determining an initial input electric power for a plasma-exciting antenna from the first initial electric-power value or the second initial electric-power value; a step for, when the first initial electric-power value is determined as the initial input electric power, supplying the determined initial input electric power to the plasma-exciting antenna for at least a length of time equal to or longer than the initial electric-power application time; and a step for increasing the output of high-frequency electric power to be supplied to the plasma-exciting antenna from the initial input electric power to the recipe-set electric-power value in a stepwise manner.
More Like This:
Inventors:
NOMURA MASAMICHI (JP)
SAITO YUSUKE (JP)
HIRAIDE KEISUKE (JP)
SAITO YUSUKE (JP)
HIRAIDE KEISUKE (JP)
Application Number:
PCT/JP2023/030581
Publication Date:
March 07, 2024
Filing Date:
August 24, 2023
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/205; H01L21/3065; H05H1/46
Foreign References:
| JP2013182966A | 2013-09-12 | |||
| JP2016065299A | 2016-04-28 | |||
| JP2015095493A | 2015-05-18 | |||
| JP2021026904A | 2021-02-22 | |||
| JP2016195145A | 2016-11-17 | |||
| JP2010212731A | 2010-09-24 |
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
Download PDF: