Title:
POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/168732
Kind Code:
A1
Abstract:
[Problem] To obtain a positive-acting photosensitive resin composition which is used for liquid-crystal display elements, organic EL display elements, etc., gives cured films having surfaces with high water repellency and high oil repellency, leaves little residue after patterning even with a high-concentration developing solution, and can form a cured-film image that is reduced in outgassing during high-temperature burning. [Solution] This positive-acting photosensitive resin composition comprises (A) component, which is a polymer having a liquid-repellent group, (B) component, which is an alkali-soluble resin having an N-hydroxyphenyl group, (C) component, which is a 1,2-quinonediazide compound, (D) component, which is a crosslinking agent, and (E) a solvent.
Inventors:
OOMURA HIROYUKI (JP)
INAMI KAYO (JP)
HATANAKA TADASHI (JP)
INAMI KAYO (JP)
HATANAKA TADASHI (JP)
Application Number:
PCT/JP2022/003127
Publication Date:
August 11, 2022
Filing Date:
January 27, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08F20/52; C08G77/24; G02F1/1335; G03F7/004; G03F7/023
Domestic Patent References:
| WO2013133392A1 | 2013-09-12 |
Foreign References:
| JP2012226044A | 2012-11-15 | |||
| JP2016040577A | 2016-03-24 | |||
| JP2019045622A | 2019-03-22 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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