Title:
PRODUCTION METHOD FOR TRANSPARENT CONDUCTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2021/187574
Kind Code:
A1
Abstract:
This production method for a transparent conductive film includes: a preparation step for preparing a transparent substrate (10); and a film formation step for forming an amorphous light-transmissive conductive layer (20) by forming a light-transmissive conductive material as a film using a sputtering method. In the sputtering method at the film formation step, the light-transmissive conductive material is formed as a film using a sputtering gas that includes a rare gas having a larger atomic number than argon, and under the condition in which the film formation pressure is between 0.04 Pa to 0.9 Pa inclusive.
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Inventors:
KARASUDA TAISUKE (JP)
FUJINO NOZOMI (JP)
TAKAO HIROYUKI (JP)
FUJINO NOZOMI (JP)
TAKAO HIROYUKI (JP)
Application Number:
PCT/JP2021/011149
Publication Date:
September 23, 2021
Filing Date:
March 18, 2021
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
International Classes:
B32B9/00; B32B7/00; B32B7/023; B32B7/025; B32B9/04; C23C14/08; C23C14/34; G02F1/1333; G02F1/1343; G06F3/041; H01B5/14; H01B5/16; H01B13/00; H01L31/0224; H01Q1/38; H01Q1/52; H05K9/00
Foreign References:
| JPH05334924A | 1993-12-17 |
Attorney, Agent or Firm:
OKAMOTO, Hiroyuki et al. (JP)
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