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Title:
SOLID-STATE IMAGING DEVICE, METHOD FOR MANUFACTURING SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/201000
Kind Code:
A1
Abstract:
Provided are a solid-state imaging device, a method for manufacturing a solid-state imaging device, and an electronic apparatus with which it is possible to suppress an increase in junction capacitance and wiring capacitance, prevent a decrease in conversion gain by suppressing an increase in floating diffusion capacitance, and additionally improve noise characteristics. A source follower element (SF) is disposed adjacent to a first side portion SDP1 of a floating diffusion FD10 in a first direction orthogonal to the first side portion SDP1. A reset element is disposed adjacent to a second side portion SDP2 of the FD10 in the first direction. The FD10 and the source follower element are connected by a wire WR20. Photoelectric conversion elements (PD10, PD11…) adjacent to each other in a second direction are disposed with a first interval D1 therebetween allowing formation of at least the source follower element and the reset element therein. Photoelectric conversion elements (PD11, PD12…) adjacent to each other in the first direction are disposed with a second interval D2 therebetween which is narrower than the first interval D1.

Inventors:
MIYAUCHI KEN (JP)
MORI KAZUYA (JP)
Application Number:
PCT/JP2021/013633
Publication Date:
October 07, 2021
Filing Date:
March 30, 2021
Export Citation:
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Assignee:
BRILLNICS SINGAPORE PTE LTD (SG)
International Classes:
H01L27/146; H04N5/369; H04N5/374; H04N5/3745
Domestic Patent References:
WO2016080337A12016-05-26
Foreign References:
JP2006222427A2006-08-24
JP2018093392A2018-06-14
JP2011114323A2011-06-09
JP2010003995A2010-01-07
JP2014204364A2014-10-27
JP2010183443A2010-08-19
JP2002217397A2002-08-02
JP2016115855A2016-06-23
JP2011249406A2011-12-08
US20160150169A12016-05-26
JP2013084744A2013-05-09
Attorney, Agent or Firm:
ATENDA PATENT FIRM (JP)
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