Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/042806
Kind Code:
A1
Abstract:
In the present invention, a substrate processing device includes: circulation piping for forming a circulation passage through which a chemical liquid in a chemical-liquid tank is caused to circulate; supply piping for leading the chemical liquid from the circulation piping to a chemical-liquid nozzle; a supply valve that can be switched between an open state in which the chemical liquid flowing through the supply piping toward the chemical-liquid nozzle is allowed to pass through, and a closed state in which supply of the chemical liquid from the supply piping to the chemical-liquid nozzle is stopped; recovery piping for leading the chemical liquid from a cup to the chemical-liquid tank; and branch piping for leading the chemical liquid in the circulation piping to the recovery piping.
Inventors:
IWAO MICHINORI (JP)
Application Number:
PCT/JP2015/057020
Publication Date:
March 24, 2016
Filing Date:
March 10, 2015
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Foreign References:
| JP2008130835A | 2008-06-05 | |||
| JP2013211525A | 2013-10-10 | |||
| JPH0339838U | 1991-04-17 |
Attorney, Agent or Firm:
INAOKA, Kosaku et al. (JP)
Kosaku Inaoka (JP)
Kosaku Inaoka (JP)
Download PDF: