Title:
SULFONIUM SALT-BASED MONOMOLECULAR RESIN ACID GENERATOR AND PHOTORESIST COMPOSITION THEREOF
Document Type and Number:
WIPO Patent Application WO/2020/233550
Kind Code:
A1
Abstract:
The present invention relates to a compound represented by formula (I) and a photoresist composition thereof. The compound of the present invention has dual functions of both acid generation and acid sensitivity, that is, same can be used as both an acid generator of a photoresist and a host material of the photoresist, thereby facilitating the achievement of the regulation of the acid diffusion and the effective reduction of the edge roughness.
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Inventors:
CHEN JINPING (CN)
LI YI (CN)
ZHANG WEIJIE (CN)
YU TIANJUN (CN)
ZENG YI (CN)
LI YI (CN)
ZHANG WEIJIE (CN)
YU TIANJUN (CN)
ZENG YI (CN)
Application Number:
PCT/CN2020/090907
Publication Date:
November 26, 2020
Filing Date:
May 18, 2020
Export Citation:
Assignee:
THE TECHNICAL INST OF PHYSICS AND CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN)
International Classes:
C07C381/12; G03F7/004
Foreign References:
| CN101522613A | 2009-09-02 | |||
| CN101522613A | 2009-09-02 | |||
| CN108147983A | 2018-06-12 | |||
| CN107324978A | 2017-11-07 | |||
| US4374066A | 1983-02-15 |
Attorney, Agent or Firm:
BEIJING ORIGINTELLIGENCE IP LAW FIRM (CN)
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