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Title:
VACUUM PLASMA SPRAYING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/065920
Kind Code:
A1
Abstract:
This vacuum plasma spraying method, with a 2-10 kW plasma power supply output in a vacuum container 6, plasmifies a working gas with a DC arc to generate a plasma jet 10, and, from a supply port 11 of a spray gun 3, supplies a raw material powder with an average particle diameter of 1-10 μm into the plasma jet 10, forming a sprayed film, wherein this vacuum plasma spraying method can suppress alteration of the raw material powder and form a dense film.

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Inventors:
KUROKI NOBUYOSHI (JP)
SUIDZU TATSUO (JP)
Application Number:
PCT/JP2020/036940
Publication Date:
April 08, 2021
Filing Date:
September 29, 2020
Export Citation:
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Assignee:
TOCALO CO LTD (JP)
International Classes:
C23C4/134; C23C4/137; H05H1/24; H05H1/26
Domestic Patent References:
WO2018105700A12018-06-14
Foreign References:
JP2018078054A2018-05-17
JP2017515968A2017-06-15
JPH0798255A1995-04-11
JPH11172404A1999-06-29
Attorney, Agent or Firm:
ISEKI Katsumori et al. (JP)
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