WASHING DEVICE

WIPO Patent Application WO/2015/098699

A1

[Problem] To provide a washing device which can carry out steps for both washing and drying a small substrate, for which enlargement of volume is prevented, substrate drying in which sufficient centrifugal force can be applied during the drying step can be performed even with a small substrate, and with which high substrate-purity can be achieved. [Solution] Provided is a washing device the volume of the structure of which is less than 1.0m3, that applies a centrifugal force of at least 151g to a substrate when drying, and that includes one chuck device for washing and drying the substrate the surface area of which is less than 25.8064cm2. The chuck device includes a rotation shaft for rotating the substrate. The substrate is disposed so as to be eccentric with respect to the rotational center of the rotation shaft, and then the substrate is dried. Further provided is a rotation mechanism for rotating the chuck device. The chuck device is rotated by the rotation mechanism and the substrate is spin dried using eccentricity. Or, the chuck device is a disk base having a rotation shaft and is provided with a vacuum chuck that holds the substrate by adsorbing the substrate to regions of the disk base other than the center.

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AOTA NATSUKO (JP)
TAKAHASHI YUJI (JP)
YAGISAWA TAKAHIRO (JP)
KUROIWA TERUO (JP)
KATAKURA HARUJI (JP)
AIDA HIDEO (JP)
ISHIDA YUSO (JP)
UCHIUMI HIDEHIRO (JP)

PCT/JP2014/083565

July 02, 2015

December 18, 2014

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NAMIKI PRECISION JEWEL CO LTD (JP)

H01L21/304; F26B5/08; H01L21/683

JP2012054414A	2012-03-15
JP2013145860A	2013-07-25

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