Title:
WATER RETAINING MATERIAL COMPOSITION FOR PAVING AND METHOD FOR APPLYING WATER RETAINING PAVING
Document Type and Number:
WIPO Patent Application WO/2007/023570
Kind Code:
A1
Abstract:
This invention provides a water retaining material composition for paving,
which can be produced without the need to use any special production apparatus
and does not substantially cause a deterioration in properties even after the
elapse of one year or longer after use in the application of paving, and a method
for applying water retaining paving that uses the water retaining material composition
for paving, can efficiently absorb rain water even in the case of short-time severe
rainfall, and has a road surface cooling capability high enough to prevent a heat
island phenomenon. The water retaining material composition for paving is characterized
by comprising 100 parts by mass of a mixture and 1 to 35 parts by mass of cement, the
mixture comprising 70 to 99.95% by mass of an inorganic powder having such a particle
size distribution that not less than 60% by mass of the powder is accounted for
by particles having a diameter of not more than 425 μm, and containing not
less than 50% by mass of any one of SiO2 and CaCO3 or not less
than 50% by mass in total of SiO2 and CaCO3, and 0.05 to 30%
by mass of a granulated blastfurnace slag. The inorganic powder may be a silt-based
powder.
More Like This:
Inventors:
HASEGAWA KAZUHIRO (JP)
KOGIKU FUMIO (JP)
TAKAGI MASATO (JP)
KOGIKU FUMIO (JP)
TAKAGI MASATO (JP)
Application Number:
PCT/JP2005/015826
Publication Date:
March 01, 2007
Filing Date:
August 24, 2005
Export Citation:
Assignee:
JFE STEEL CORP (JP)
HASEGAWA KAZUHIRO (JP)
KOGIKU FUMIO (JP)
TAKAGI MASATO (JP)
HASEGAWA KAZUHIRO (JP)
KOGIKU FUMIO (JP)
TAKAGI MASATO (JP)
International Classes:
E01C7/10; C04B7/153; C04B28/18; E01C11/24
Foreign References:
JP2004197310A | 2004-07-15 | |||
JP2003129407A | 2003-05-08 |
Attorney, Agent or Firm:
OCHIAI, Kenichiro (JFE Techno-Research Corporation 7th Floor, Yanagiya Building, 1-10, Nihonbashi 2-chom, Chuo-ku Tokyo 27, JP)
Download PDF:
Previous Patent: NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND ITS WRITE METHOD
Next Patent: COVER FOR FACE MILL
Next Patent: COVER FOR FACE MILL