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WO/1994/020594A1 |
The aqueous floor-cleaning and floor-care agents described contain a synthetic anionic surfactant and a floor-care substance selected from the group comprising waxes and soaps. These agents differ from currently used agents by virtue of ...
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WO/1994/017150A2 |
The invention relates to a method for removing strongly adhered dirt from wood objects. The invention has three particularities: 1) the dirt is removed without taking off varnishes, silver guilts; 2) it gives the objects a natural luster...
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WO/1994/014942A1 |
The water-based agents proposed have a pH between 5 and 9 in the undiluted state and contain, in addition to surfactants and waxes or polymers as film-forming materials, an alcohol selected from the group comprising benzyl alcohol, 2-phe...
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WO/1994/014910A1 |
The invention concerns an emulsion which has a pH between 5 and 9 in the undiluted state and contains, in addition to a natural or synthetic wax, a monoalkyl diethylene glycol ether with 1 to 4 C-atoms in the alkyl group. The emulsion is...
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WO/1994/014909A1 |
The invention concerns an emulsion which has a pH between 5 and 9 in the undiluted state and contains, in addition to a natural or synthetic wax, an alcohol selected from the group comprising benzyl alcohol, 2-phenylethanol, 2-phenoxyeth...
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WO/1994/014908A1 |
The invention concerns an emulsion which, in the undiluted state, has a pH between 5 and 9 and which contains, in addition to an at least partly water-insoluble polymer with a minimum film-formation temperature between 0 and 70 °C, a mo...
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WO/1994/014907A1 |
The invention concerns an emulsion which, in the undiluted state, has a pH between 5 and 9 and which contains, in addition to an at least partly water-insoluble polymer with a minimum film-formation temperature between 0 and 70 °C, an a...
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WO/1994/011468A1 |
This invention relates to perfluoroalkyl group terminated urethanes, thiourethanes and ureas of the general formula: (R-X-CONH)mA where m is 1, 2, or 3, R is Rf-E and optionally R1 with the proviso that at least one R is Rf-E, Rf is a pe...
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WO/1994/008756A1 |
Polishing compositions and methods for removing scratches and other imperfections from a variety of plastic surfaces in order to improve the clarity and optical quality of the plastic surface are disclosed. Such polishing compositions in...
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WO/1994/007959A1 |
A process for producing a coating material composition characterized by reacting an emulsion of a polymer having an acid value of 20 to 200, prepared by polymerizing an ethylenically unsaturated monomer, with a calcium compound in a chem...
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WO/1994/005731A1 |
Solvent-free, oil-in-water emulsion polishes, especially useful as automotive polishes, with application, buffability and durability characteristics comparable to solvent-based polishes are described which are substantially free of added...
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WO/1994/001588A1 |
The invention relates to a method for regenerating and preserving skins or leathers, specially bindings, and which consists in applying to the skin, during a first step, a nutritive cream comprised of saponified greasse, excipient, disti...
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WO/1993/022103A1 |
An abrasive composition for use in polishing or planarizing the surface of a work piece is provided comprising about 30 to 50 percent of cerium oxide; about 8 to about 20 percent of fumed silica; and about 15 to about 45 percent of preci...
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WO/1993/013160A1 |
The present invention relates to a novel kit for preparing a colored polish for application to a surface, such as an automobile finish. The kit comprises a base polish, formulated to be substantially neutral in color when applied to said...
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WO/1993/011179A1 |
A graft copolymer is produced by grafting both at least one perfluoroacrylate and at least one N-(oxymethyl)acrylamide, e.g., IBMA, onto a poly(oxyalkylene) composition. This graft copolymer is water dispersible prior to crosslinking whi...
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WO/1993/004131A1 |
A polysiloxane resin composition includes a blend of silanols, colloidal silica, an ultraviolet-absorbing material, and a dye for correcting the color of a film formed from the resin composition. The silanols include a silanol from the g...
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WO/1992/011331A1 |
Emulsifiable linear polyethylene compositions which exhibit good hardness and color characteristics can be obtained by oxidizing a blend of 90 to 60 % by weight of either linear low density polyethylene or high density polyethylene and 1...
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WO/1992/011330A1 |
According to the novel process, cleaning and maintenance agents for floors, shoes, leather and furniture are made by mixing a wax emulsion containing an alkyl glycoside as an emulsifier with the other components of the agents. The alkyl ...
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WO/1992/001557A1 |
A protective glazing (5) comprising a glass substrate (10) and a resin coating (12) on at least one surface of the substrate. The coating includes an ultraviolet absorbing material and a dye for correcting the transmission color of the s...
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WO/1992/000288A1 |
A furniture polish concentrate is disclosed. Also disclosed is a furniture polish composition formulated from such a concentrate. The furniture polish concentrate comprises dimethyl silicone and a poly-(dimethyl)-co-poly(methyl, oxygen-c...
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WO/1991/017223A1 |
Disclosed are emulsion polish compositions comprising a copolymeric siloxane selected from the group consisting of a poly(dimethyl)-co-poly(methylalkyl) siloxane polymer, a poly(dimethyl)-co-poly(methyl, oxygen-containing) siloxane polym...
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WO/1991/001336A1 |
A method for producing an acidic, concentrated, polymeric emulsion that can be diluted and thereafter neutralized to provide a novel polymeric thickener is disclosed. The method comprises emulsion-polymerizing, in acidic aqueous media, a...
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WO/1990/011363A1 |
Acetan is an extracellular polysaccharide secreted by Acetobacter xylinium. It has been found to form thixotropic aqueous dispersions and is thus useful in compositions such as foodstuffs, adhesives, cleaners, toothpastes and paints.
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WO/1989/010950A1 |
A wax-based sliding agent contains at least one fluoropolymer in micropowder form, in particular a polytetrafluorethylene of molecular weight between 50,000 and 400,000. The powder particle size is less than 15 mum, and lies preferably b...
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WO/1989/010380A1 |
The present invention provides for aqueous polymer dispersions characterized by a water-dispersible polyurethane/acrylic support resin/acrylic polymer, with the acrylic polymer being polymerized from monomers in the presence of the water...
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WO/1989/009660A1 |
A method and apparatus for dry cleaning and shining motor vehicles and other waxable surfaces. The method includes the steps of applying a solution (14) (16) (18) of ammonia, water and alcohol to the surface of the vehicle (20), toweling...
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WO/1988/006612A1 |
Polishing substance for shoes and other leather items that in claim No 1 is substantially made up of 50-200 g cyclohexanone resin, 10-200 g polystyrene, 1-100 g camphor, 100-900 ml xylene, 100-800 ml acetone and 10-150 g colouring agent.
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WO/1988/005066A1 |
An agent for treating a coated surface, which contains at least one member selected from the group consisting of metal alkoxides represented by general formula: M(OR)n, (wherein M represents at least one metal atom selected from the grou...
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WO/1988/001281A1 |
Polythiol crosslinking agents are used in combination with electron beam and/or photoinitiator ultraviolet cure to enhance the high temperature shear properties of rubber-based pressure-sensitive adhesives.
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WO/1988/000184A1 |
N-hydrocarbon substituted lactams, particularly N-alkyl substituted lactams having formula (A), wherein R' is a hydrophobic radical such as linear or branched chain alkyl group containing from 8 to 20 carbon atoms, most preferably 8 to 1...
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WO/1987/005319A1 |
Lubricating composition on the basis of waxy substances supported by means able to allow it to be applied by rubbing onto the soles of skis and the like, constituted by a blend formed by at least one hydrocarbon wax (ski-wax) dissolved i...
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WO/1987/002690A1 |
Novel emulsifiable polyethylene parraffin blend compositions, the blend compositions having a viscosity of about 95 to 2,600 cp at 150oC and an acid number of about 15 to 17 milligrams KOH/gm, said blend composition comprising (a) about ...
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WO/1987/002683A1 |
A dry-type textile cleaning article which comprises a friable hydrophilic polyurethane foam body (1) which incorporates abrasive particles, solvents, surfactants, and adjuvants such as fragrance, biocides, and fiber emollients. When rubb...
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WO/1983/003253A1 |
A non-abrasive metal polish or cleaning agent for objects, particularly household objects and ornaments, having surfaces of copper, silver, or chromium or of any alloy which is comprised of these metals either separately or together. The...
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WO/1981/001964A1 |
A preparation of water base character in the nature of a dispersion for providing a continuous even film or coating upon application comprising a water phase and a continuous phase wherein the active ingredient may be either water solubl...
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WO/1980/001355A1 |
Produced of ski wax market the wax in a form of raw material in blocks, boxes and tubes. The consumers are left with the difficult and usually unpleasant task of further transforming the substance of wax into the very thin layer of wax w...
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JP7487507B2 |
To provide a polishing agent capable of polishing a SiH4 oxide film at a high polishing rate and a polishing method using the same.A polishing agent contains abrasive grains, an amine compound, and water. The abrasive grain contains sili...
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JP2024068133A |
The present invention provides a CMP slurry composition for tungsten polishing that improves flatness after polishing due to its high polishing rate and low erosion. A CMP slurry composition for polishing tungsten includes one or more so...
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JP7480384B2 |
A polishing composition used for polishing an object to be polished, the polishing composition including: abrasive grains; an organic compound; and a liquid carrier, in which the number of silanol groups per unit surface area of the abra...
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JP7477964B2 |
The chemical-mechanical polishing composition of the present invention is for polishing a substrate and contains an abrasive, a hydroxyethyl cellulose having a weight average molecular weight of 200,000 or less, a basic component, a surf...
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JP2024059837A |
The present invention provides a method for producing silica sol with less intermediate products. The present invention also provides a method for removing intermediate products in silica sol that can easily reduce the amount of intermed...
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JP2024058695A |
[Problem] To provide a silica fine particle dispersion liquid that can polish silica films, Si wafers, and difficult-to-process materials at high speed. [Solution] A silica fine particle dispersion containing pseudospherical silica fine ...
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JP2024058420A |
In one aspect, there is provided a polishing liquid composition for a silicon oxide film that can both improve the polishing rate of a silicon oxide film and improve the in-plane uniformity of a substrate surface after polishing. [Soluti...
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JP2024052507A |
An object of the present invention is to provide a polishing abrasive dispersion liquid that can obtain an excellent polishing rate while suppressing the particle hardness of the abrasive grains to a practical range. [Solution] A polishi...
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JP2024051851A |
An object of the present invention is to provide a floor polish composition capable of forming a coating with excellent gloss and durability. [Solution] It is characterized by containing (a) an acid group-containing resin emulsion, (b) a...
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JP2024515543A |
The present invention relates to a polishing slurry composition, which comprises nanoceria polishing particles; and a water-soluble compound containing an intramolecular hydrophilic group; optionally, an amphoteric compound containing an...
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JP2024048924A |
The present invention provides a polishing composition, a method for producing a polishing composition, a polishing method, and a method for producing a semiconductor substrate that can increase the polishing selectivity ratio of SiOC to...
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JP7464201B2 |
The present invention addresses the problem of providing silica particles which combine excellent rates of polishing objects to be polished with inhibition of scratching and which have a moderate hardness to be less apt to stick to the o...
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JP2024514473A |
The present disclosure relates to aqueous suspensions suitable for chemical mechanical planarization (CMP), uses of aqueous suspensions, and methods of CMP using aqueous suspensions. This suspension and method can be used for CMP of sili...
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JP7458732B2 |
To provide a polishing composition that is used in the polishing of an Ni-P substrate, and maintains a practical polishing rate, while having excellent scratch reduction performance.There is provided a polishing composition used for the ...
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