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JP5267029B2 |
An illumination optical apparatus (13) guides exposure light (EL) emitted from an exposure light source (12), to an illumination target object (R). The illumination optical apparatus (13) has a plurality of spatial light modulation membe...
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JP5268333B2 |
The optics (6) has a facet mirror (10) including a set of facets configured to generate a defined illumination setting in an illumination field, where each facet is allocated to a partial beam of radiation. The facet mirror includes sub-...
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JP5265721B2 |
An illumination system comprising a polarization member which comprises first and second polarization modifiers each connected to an actuator configured to move a respective polarization modifier into at least partial intersection with a...
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JP2013145378A |
To provide an illumination optical system for a projector with high illumination efficiency.In an illumination optical system for a projector having a liquid crystal panels 108a to 108c, integrators 101a, 101b, a polarization conversion ...
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JP5247867B2 |
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JP5247416B2 |
To provide a sunlight collecting system for adjusting thermal energy obtained without changing the state of heliostats. A center mirror 1 is moved parallel in the vertical direction. When the center mirror 1 is moved vertically parallel ...
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JP2013142842A |
To provide a light source device in which a light source and an optical lens are integrated on the base, the device being designed to improve productivity in order to improve the use efficiency of light beams output from the light source...
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JP5241270B2 |
An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured t...
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JP5237708B2 |
The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projecti...
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JP5239830B2 |
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JP5239829B2 |
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JP5238879B2 |
An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the prima...
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JP5232086B2 |
An exposure method and apparatus for simultaneously transferring patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are set. The nine areas are a first area (28) including the o...
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JP2013527988A |
An illumination system of a microlithographic projection exposure apparatus includes a spatial light modulator which varies an intensity distribution in a pupil surface. The modulator includes an array of mirrors that reflect impinging p...
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JP2013130767A |
To provide a projector which can project light of which directions of polarization are uniform at the whole of color light, can reduce cost of the projector since a wavelength-selective wavelength plate is not used, the projector having ...
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JP5225382B2 |
An optical element includes first regions which reflect or transmit the light falling on the optical element. The optical element also includes second regions which are in each instance separated by a distance from a first region and whi...
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JP5228878B2 |
A coupling lens for coupling first light having a first wavelength from a first light source with a second light having a second wavelength from a second light source disposed adjacent to the first light source in substantially the same ...
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JP5227970B2 |
A method for illuminating the surface of an object by using a source beam is provided. The source beam is partitioned into as many illumination sub-beams as there are surface elements to be illuminated, and their aperture is modulated as...
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JP5220743B2 |
Proposed is an illumination device (1), comprising a semiconductor light source (10) for generating light, a primary optical system (20) for feeding the light to a secondary optical system (30), which is provided for radiating the light ...
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JP5220136B2 |
An illumination optical system which illuminates an illumination surface with light from a light source, includes a divider which divides light from the light source to generate a plurality of light beams, a first reflective integrator w...
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JP5223921B2 |
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JP2013525856A |
A ring light illuminator with annularly arranged light sources is disclosed. To each light source there corresponds a beam shaper comprising a light collector, a homogenizing means for light from the light source, and an imaging means fo...
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JP5213761B2 |
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JP2013120264A |
To provide projectors and a projection system which allow a projection image to be excellently and stereoscopically viewed.A projector 2A comprises: a polarization switching device 22 in which a retardation value is switched between a fi...
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JP5206132B2 |
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JP5201061B2 |
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JP5197149B2 |
An illumination optical system has a condenser, a first lens array, a second lens array, and a polarized beam splitting surface. The condenser and the first and second lens arrays compress light incident on the condenser. The distance be...
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JP5195991B2 |
Provided are an illumination device and a display apparatus capable of reducing generation of an interference pattern, while achieving downsizing and enhancing light use efficiency. An illumination device includes: a light source section...
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JP5200182B2 |
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JP5197227B2 |
An illumination optical system 1 includes a light source 11 including a plurality of light emitting sections 11a, 11b, and 11c arrayed in a specific direction, and an integrator 21 including a plurality of lens cells arrayed in the speci...
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JP2013076927A |
To achieve the reduction of the manufacturing costs and scale of a reading head.An optical element 15 includes: an optical block 20; a first reflection film 21 and a second reflection film 22 formed on the surfaces of first and second cu...
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JP5188927B2 |
To provide a lighting optical system suitable for an observation optical system having a wide viewing angle, used for an endoscope used in medical or industrial sectors, for example, appropriately distributing light to the side and the b...
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JP5187632B2 |
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JP5187631B2 |
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JP5187636B2 |
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JP2013072888A |
To provide a projection type image displaying apparatus that enables the range of color reproduction to be expanded even when a luminous body having a broad spectrum is used.A projection type image displaying apparatus 100 comprises a li...
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JP2013068651A |
To provide an image display device having a narrow viewing angle capable of contributing to energy saving by eliminating waste of energy caused by having a wider viewing angle than required.An image display device includes: a convex lens...
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JPWO2011065374A1 |
For example, a catadioptric system applicable to an exposure apparatus using EUV light, which is an imaging optical system capable of increasing the numerical aperture while enabling optical path separation of a luminous flux. The reflec...
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JP5182588B2 |
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JP5172063B2 |
A condensing and collecting optical system includes a first reflector and second reflector. The first and second reflectors and includes a portion of an ellipsoid of revolution having two focal points and an optical axis. A source of ele...
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JP5170221B2 |
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JP5167873B2 |
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JP5162560B2 |
A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye integrator, and the first array of lenses...
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JP5158439B2 |
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JP5157945B2 |
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JP5156056B2 |
A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. ...
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JP2013041018A |
To provide a dimmer capable of enhancing an extinction rate in a state that a light-shielding member is closed even when lenses constituting a lens array are arranged at odd-numbered rows in a direction in which the light-shielding membe...
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JP2013041017A |
To provide a dimmer capable of maintaining a separation distance between end portions of a light-shielding member and of enhancing an extinction rate, and further to provide a projector.A dimmer blocks a light beam made incident thereto ...
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JP2013041760A |
To provide a lighting device with a further improved light use efficiency than a prior art.The lighting device 100 includes a light source device 110 emitting light, a first lens array 120 with a plurality of first micro lenses 122, a se...
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JP2013037300A |
To provide an exposure device capable of continuously producing a high-image-quality, inexpensive liquid crystal panel at a high yield, in a process for manufacturing a TFT substrate using a gray tone mask and to provide an exposure meth...
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