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WO/2017/072195A1 |
The invention relates to an optical assembly (32), comprising an optical element (13), in particular for the reflection of EUV radiation (4), and a protective element (30) for protecting a surface (31) of the optical element (13, 14) fro...
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WO/2017/073604A1 |
In the present invention, light from a light source is projected onto a mask via a high-resolution optical system, and high-resolution optical image data is obtained. In addition, such light is projected onto the same mask via a low-reso...
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WO/2017/069090A1 |
Provided is a glass-resin composite including a glass plate and a resin film, wherein the glass-resin composite is characterized in that: the resin film is provided on the entire surface of at least one main surface of the glass plate; t...
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WO/2017/067755A1 |
A method including identifying that an area of a first substrate includes a hotspot (710) based on a measurement and/or simulation result pertaining to a patterning device in a patterning system, determining first error information (720)...
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WO/2017/067239A1 |
Provided are a mask plate and a manufacturing method thereof, and a method using a mask plate to compose a pattern. A pattern region (01) of the mask plate is provided with a first pattern portion (10) and second pattern portions (20), w...
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WO/2017/067752A1 |
A method including modelling, by a computer system, a high resolution patterning error information of a patterning process involving a patterning device in a patterning system using an error mathematical model, modelling, by the computer...
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WO/2017/067024A1 |
A color resist mask plate and method for use thereof. A color resist mask plate (10) comprises an alignment coating mark region (11) and an alignment testing mark region (12); the alignment coating mark region (11) comprises a plurality ...
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WO/2017/067757A1 |
A method including: determining first error information (1310) based on a first measurement and/or simulation result (1300) pertaining to a first patterning device in a patterning system; determining second error information (1330) based...
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WO/2017/067756A1 |
A method including: obtaining information describing a modification made or to be made by a pattern modification tool to a patterning device for a patterning process (1100); obtaining a spatial distribution of temperature and/or deformat...
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WO/2017/066319A2 |
Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water va...
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WO/2017/063951A1 |
The invention relates to a method for producing a microstructure (10), having the following steps: providing a photo-sensitive layer (12) on a carrier substrate (11); arranging a photomask (20) having a transparent substrate (21) on or a...
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WO/2017/063040A1 |
In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (4...
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WO/2017/060192A1 |
A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plur...
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WO/2017/054247A1 |
A photomask plate for LED manufacturing, comprising: a wafer exposure unit (1) and a non-wafer exposure unit (2), a fluorescent marker (3) for distinguishing different photomask plates being provided on the non-wafer exposure unit (2). T...
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WO/2017/054121A1 |
A method of making a multilayer structure is provided, comprising providing a substrate; providing a coating composition, comprising: a liquid carrier, a polycyclic aromatic additive and a MX/graphitic carbon precursor material having a ...
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WO/2017/059286A1 |
Structures and associated methods for making high index of refraction surface coatings for masks used in imprint lithography for application to patterning for advanced semiconductor and data storage devices.
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WO/2017/058638A1 |
A calibration curve for a wafer comprising a layer on a substrate is determined. The calibration curve represents a local parameter change as a function of a treatment parameter associated with a wafer exposure to a light. The local para...
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WO/2017/055086A1 |
A method involving measuring a first metrology target designed for a first range of values (806) of a process parameter (802); measuring a second metrology target designed for a second range of values (808) of the same process parameter ...
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WO/2017/057376A1 |
Provided is a mask blank which makes it possible to suppress chrome migration. This mask blank (100) is provided with a structure obtained by stacking, in order, a phase shift film (2) and a light shielding film (3) on a translucent subs...
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WO/2017/059314A1 |
An optical source for a photolithography tool includes a source configured to emit a fist beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelengt...
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WO/2017/050774A1 |
Methods for treating substrates are described. The methods comprise the steps of flowing an aqueous liquid medium through a flow channel and at least one outlet slit onto a substrate to be treated and exposing the aqueous liquid medium t...
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WO/2017/053128A1 |
Methods and apparatus for characterizing a beam parameter associated with an electromagnetic beam of a light source. The light source exposes a phase-shifted target through a set of focal distances relative to a focal plane of a substrat...
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WO/2017/053316A1 |
Techniques disclosed herein provide a method and fabrication structure for pitch reduction for creating high-resolution features and also for cutting on pitch of sub-resolution features. Techniques include using multiple materials having...
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WO/2017/045225A1 |
A spacer (4) and a manufacturing apparatus therefor. The apparatus comprises a photomask (10) and an exposure apparatus (20) directly facing the photomask (10), wherein the photomask (10) comprises a central light-transmissive region (10...
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WO/2017/047490A1 |
A mask blank 10 according to the present invention comprises: a light-blocking film 4 which has a single layer structure or a multilayer structure composed of a plurality of layers, and wherein at least one layer of the light-blocking fi...
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WO/2017/049267A1 |
Methods for forming a titanium-containing hard mask film on a substrate surface by exposing the substrate surface to a titanium-containing precursor. The titanium-containing hard mask comprises one or more of silicon, oxygen or carbon at...
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WO/2017/045391A1 |
A mask plate, comprising a transparent substrate and a mask pattern formed on the surface of the transparent substrate. The mask pattern comprises a first region (1) for forming a display region inner membrane layer graph and a second re...
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WO/2017/041347A1 |
A PSVA-type liquid crystal display panel and a manufacturing method therefor. The PSVA-type liquid crystal display panel comprises a patterned passivation layer (22), the upper surface of the passivation layer (22) comprising grooves (22...
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WO/2017/041438A1 |
An optical mask plate and an exposure system.The optical mask plate is provided with a composition pattern for forming a mapping pattern, the composition pattern comprising a strip-shaped main body (11) for forming a linear pattern, wher...
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WO/2017/038213A1 |
Provided is a mask blank for a phase shift mask, said mask blank being provided with an etching stopper film that satisfies the characteristics of having: higher tolerance than a translucent substrate with respect to dry etching wherein ...
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WO/2017/035909A1 |
A photomask(2) for optical alignment and an optical alignment method. By aligning the tail ends of first light-transmission patterns(313) which form a first photomask figure(3), and aligning the front ends of second light-transmission pa...
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WO/2017/039184A1 |
A device for removing an adhesive for adhering a mask and a pellicle from the mask is disclosed. The disclosed adhesive removing device comprises: a laser emitting unit for emitting a laser beam at an adhesive layer formed between the ma...
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WO/2017/036173A1 |
An optical proximity correction method, comprising: dissecting an edge of a design pattern (120/220) to form segments (Seg1/Seg2); setting target points of the segments (Seg1/Seg2), and if the segments (Seg1/Seg2) translate in a directio...
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WO/2017/036944A1 |
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a bord...
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WO/2017/032804A1 |
The invention relates to a device for applying a liquid medium which is exposed to UV radiation to a substrate, said device comprising: a housing, having an elongated chamber, at least one inlet opening that opens towards the chamber, an...
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WO/2017/034372A1 |
Provided are a method for manufacturing a cliché for offset printing, and a cliché for offset printing manufactured using the method. The method for manufacturing a cliché for offset printing comprises the steps of: forming a light-sh...
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WO/2017/032896A1 |
The invention relates to a protection device (28) for protecting a reticle (7). Said protection device is arranged so it can tilt with respect to an object plane (6).
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WO/2017/029981A1 |
Provided is a mask blank including a phase shift film that transmits ArF exposure light at a prescribed transmittance and creates a prescribed phase difference for the transmitted ArF exposure light, while having a high ArF light resista...
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WO/2017/030109A1 |
The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas ...
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WO/2017/030318A1 |
Embodiments relate to a digital micromirror device (DMD) controller and an exposure image output processing method of same. The DMD controller comprises: a storage unit for storing an image for exposure which is received from a managing ...
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WO/2017/025949A1 |
A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface- activating solution having an activating agent that chemically activates the metallic surface;...
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WO/2017/027555A1 |
Disclosed are methods and apparatus for providing feature classification for inspection of a photolithographic mask. A design database for fabrication of a mask includes polygons that are each defined by a set of vertices. Any of the pol...
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WO/2017/025373A1 |
A product structure (407, 330') is formed with defects (360-366). A spot (S) of EUV radiation which is at least partially coherent is provided on the product structure (604) to capture at least one diffraction pattern (606) formed by the...
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WO/2017/025392A1 |
A target structure (T) made by lithography or used in lithography is inspected by irradiating the structure at least a first time with EUV radiation (304) generated by inverse Compton scattering. Radiation (308) scattered by the target s...
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WO/2017/024048A1 |
An x-ray window, which may be utilized within an x-ray source or an x-ray detector is disclosed, and a method for manufacturing the same. The x-ray window may be permeable to soft x-rays. The x-ray window may have at least one surface in...
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WO/2017/018831A1 |
The present description relates to a photomask, a laminate comprising the photomask, a photomask preparation method, and a pattern forming method using the photomask.
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WO/2017/018830A1 |
The present description relates to a photomask, a laminate comprising the photomask, a photomask preparation method, a pattern forming apparatus using the photomask and a pattern forming method using the photomask
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WO/2017/019338A1 |
Systems and methods for unwrapping phase signals obtained from interferometry measurements of patterned wafer surfaces are disclosed. A phase unwrapping method in accordance with the present disclosure may calculate a front surface phase...
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WO/2017/012846A1 |
A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a bord...
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WO/2017/011156A1 |
A method for pretreating an EUVL photomask having an exposed ruthenium surface includes subjecting the photomask to surface treatment in an oxidizing and reducing environment. Another method for pretreating an EUVL photomask having an ex...
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