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WO/2019/230313A1 |
Provided is a mask blank equipped with a phase-shift film which has reduced rear-side reflectance and which has both a function of allowing exposure light from an ArF excimer laser to transmit therethrough with a predetermined transmitta...
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WO/2019/228193A1 |
Provided are a metal-plastic composite body, a preparation method therefor and an application thereof. The metal-plastic composite body comprises a metal substrate, a metal-resin particle composite coating formed on the metal substrate, ...
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WO/2019/225360A1 |
Provided is a photomask inspection device capable of detecting a diffraction pattern more suitable for measurement. The photomask inspection device measures the pattern characteristics of the phase shift portion of a phase shift mask. Th...
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WO/2019/225503A1 |
A pellicle frame according to one aspect of the present invention includes a first surface and a second surface provided on both sides along the thickness direction, and an inner peripheral surface and an outer peripheral surface connect...
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WO/2019/223366A1 |
A method for use in manufacturing a display substrate, a method for use in manufacturing a mask, and a display device. The method for use in manufacturing the display substrate comprises the following steps: roviding a first substrate (1...
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WO/2019/225737A1 |
Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank (100) having, in...
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WO/2019/225736A1 |
Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the f...
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WO/2019/219826A1 |
The present invention relates to a method and an apparatus for determining at least one unknown effect (250) of defects (650, 660) of an element (450) of a photolithography process. The method (1000) comprises the steps of: (a) providing...
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WO/2019/222062A1 |
Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the ...
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WO/2019/221787A1 |
A laser-based manufacturing system is disclosed for fabricating non-planar three-dimensional layers. The system may have a laser for producing a laser beam with a plurality of optical wavelengths. An optically dispersive element may be u...
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WO/2019/216303A1 |
An inspecting device (1) according to one embodiment of the present invention is provided with an illuminating light source (11) which generates illuminating light for illuminating a specimen (21), a detector (16) for capturing an image ...
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WO/2019/217584A1 |
Embodiments of methods and systems for patterning of low aspect ratio stacks are described. In one embodiment, a method may include receiving a substrate comprising a patterned organic planarizing layer (OPL) mask wherein a surface of th...
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WO/2019/215110A1 |
An optical system serves to transfer the original structure portions (13) of a lithography mask (10). The original structure portions (13), which have an x/y-aspect ratio of greater than 4:1, are arranged in a line next to one another on...
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WO/2019/211083A1 |
A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one ...
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WO/2019/209591A1 |
Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated ma...
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WO/2019/206614A1 |
The present application relates to a method (3300) for removing a particle (550, 2750, 3150) from a photolithographic mask (500), including the following steps: (a) positioning (3320) a manipulator (300, 1300, 2500, 3000, 3100), which is...
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WO/2019/209449A1 |
Systems and methods discussed herein relate to patterning substrates during lithography and microlithography to form features to a set or sets of critical dimensions using dose. The dose maps are generated based upon images captured duri...
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WO/2019/209396A1 |
Embodiments of the present disclosure provide improved photolithography systems and methods using a solid state emitter device. The solid state emitter device includes an array of solid state emitters arranged in a plurality of horizonta...
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WO/2019/202921A1 |
The present invention is a quartz glass plate comprising a quartz glass plate main body, and a quartz glass member adhered via an adhesive layer to the quartz glass plate main body. In this quartz glass plate, the adhesive layer comprise...
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WO/2019/203871A1 |
Membrane-coating stereolithography (MCSL), a novel 3D printing technology, is provided, which employs the transfer of working resin to the manufacture are as a coating on a membrane, and curing of the resin using, e.g., advanced micro-di...
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WO/2019/199697A1 |
Computer implemented methods and computer program products have instructions for generating transfer functions that relate segments on lithography photomasks to features produced by photolithography and etching using such segments. Such ...
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WO/2019/200049A1 |
Methods for making molecular sieves are provided. The molecular sieves are comprised of thin semiconductors films in which a plurality of apertures is defined. The apertures are non-circular, nanoscale openings with tapered sidewalls tha...
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WO/2019/195105A1 |
A method for etching features in a stack below a mask with features is provided. A fill layer is deposited on the mask, wherein the fill layer fills the features of the mask. The fill layer is etched back to expose the mask. The mask is ...
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WO/2019/184694A1 |
A substrate edge processing method and a mask. The substrate edge processing method comprises: using a first device to form a first photoresist layer on a substrate to be processed (S20); in an exposure machine, using a mask to expose th...
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WO/2019/190566A1 |
A method for optical proximity correction (OPC) comprises creating a semi-physical model of a mask for a current layer in an IC design layout using physical parameters of a lithography process used to create the mask, the semi-physical m...
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WO/2019/188397A1 |
A mask blank (100) is provided with a phase shift film (2) on a translucent substrate (1), wherein the phase shift film (2) includes a structure in which a bottom layer (21), a middle layer (22), and a top layer (23) are laminated in thi...
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WO/2019/189310A1 |
The present invention addresses the problem of providing a mask adhesive that plastically deforms easily in the temperature region in which exposure is performed, the mask adhesive being configured so that almost no adhesive residue rema...
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WO/2019/188445A1 |
Provided is a supporting frame in which a vent hole with a detachably-attached filter can be provided and to which a pellicle film for extreme ultraviolet lithography can be pasted. A supporting frame according to an embodiment of the pr...
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WO/2019/184224A1 |
A display panel and a mask plate (500) used for manufacturing a display panel. The mask plate (500) is used to manufacture a display panel and comprises: a display zone (520), which is opened with a plurality of first through holes (521)...
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WO/2019/185296A1 |
The invention relates to a method and a device for inspecting a mask, wherein the method comprises the following steps: measuring a first intensity distribution (14, 24) generated upon illumination of a mask structure (11, 21) present on...
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WO/2019/184908A1 |
Provided are an optical mask plate (400) and a method for preparing an optical mask substrate (200) based on the optical mask plate (400). The optical mask plate (400) comprises a light-transmitting region (420) and a light-blocking regi...
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WO/2019/179786A1 |
Disclosed is a method of, and associated apparatus for, determining an edge position relating to an edge of a feature comprised within an image, such as a scanning electron microscope image, which comprises noise. The method comprises de...
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WO/2019/179747A1 |
Described herein is a method to determine a curvilinear pattern of a patterning device that includes obtaining (i) an initial image of the patterning device corresponding to a target pattern to be printed on a substrate subjected to a pa...
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WO/2019/182689A1 |
Embodiments of the present disclosure generally relate to an image projection system. The image projection system includes an active matrix solid state emitter (SSE) device. The active matrix solid state emitter includes a substrate, a s...
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WO/2019/177116A1 |
Provided is a large-sized photomask comprising a translucent substrate and a light-shielding pattern provided on the surface of the translucent substrate, wherein the large-sized photomask is characterized in that: the light-shielding pa...
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WO/2019/176410A1 |
The present invention addresses the problem of providing a pellicle which has high EUV transmittance and contains a carbonaceous film. The present invention relates to a pellicle containing a carbonaceous film, the pellicle being charact...
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WO/2019/176481A1 |
Provided is a mask blank for a phase shift mask comprising an etching stopper film having a high transmittance of at least 80% with respect to ArF exposure light and with which a transmittance difference of 5% or more can be obtained in ...
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WO/2019/172141A1 |
Provided is a pellicle wherein the generation of outgas from an adhesive layer is suppressed. The pellicle (100) comprises a pellicle film (101), a support frame (103) supporting the pellicle film, a protruding part (105) disposed on the...
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WO/2019/170356A1 |
A catalyst comprising: a first layer comprising molybdenum; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are method of preparing a catalyst as...
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WO/2019/172170A1 |
A conventional pellicle has a problem in maintaining a higher transmittance for extreme ultraviolet (EUV) light while making the EUV transmittance uniform. The present invention provides a pellicle capable of maintaining a higher transmi...
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WO/2019/169703A1 |
A mask plate (10), an array substrate, and a manufacturing method of an array substrate. The mask plate (10) is provided with first optically-transmissive regions (101) and at least two second optically-transmissive regions (102) spaced ...
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WO/2019/167622A1 |
Provided is a mask blank for a phase-shift mask, said mask blank being provided with an etching stopper film that has a high transmittance with respect to ArF exposure light and being capable of achieving a high contrast ratio with respe...
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WO/2019/162346A1 |
Described herein are different methods of training machine learning models related to a patterning process. Described herein is a method for training a machine learning model configured to predict a mask pattern. The method including obt...
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WO/2019/162280A1 |
Described herein is a method for inspection of a patterning device. The method includes obtaining (i) patterning device apparatus data of a patterning device making process, (ii) a patterning device substrate map based on the patterning ...
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WO/2019/162013A1 |
The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection sur...
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WO/2019/163310A1 |
A mask blank in which a phase shift film provided on a light-permeable substrate includes at least a nitrogen-containing layer and an oxygen-containing layer, the nitrogen-containing layer is made from a silicon nitride-based material an...
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WO/2019/158682A1 |
Described herein is a method to determine a mask pattern for a patterning device. The method includes obtaining a target pattern to be printed on a substrate, (ii) an initial continuous tone image of the patterning device corresponding t...
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WO/2019/153804A1 |
A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer (1) on a substrate, and patterning the metal layer (1) using a phase shift mask to form a pattern of metal wiring. The phase s...
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WO/2019/153796A1 |
A phase shift mask includes a transparent substrate (01) and light-shielding portions. The light-shielding portions include a first light-shielding portion (02), and over one side of it, a first compensating light-shielding portion (03),...
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WO/2019/153754A1 |
A manufacturing method for a phase shift mask plate, and a phase shift mask, said manufacturing method comprising: forming a metal shielding layer pattern (201) on a base substrate (100); sequentially forming a phase change layer (400) a...
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