Title:
回転可能なスパッタターゲットベース、回転可能なスパッタターゲット、コーティング装置、回転可能なスパッタターゲットを作成する方法、ターゲットベース接続手段、及びスパッタリング装置のための回転可能なターゲットベース装置をターゲットベースに接続する方法
Document Type and Number:
Japanese Patent JP2012506489
Kind Code:
A
Abstract:
A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder (4) having a lateral surface (3), a middle part (12), a first end region (7) and a second end region (9) opposite to the first end region, wherein at least one of the first and the second end regions has a maximum outer diameter substantially equal to or less than the outer diameter of the middle part.
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Inventors:
Lipert rotor
Himel Oliver
Himel Oliver
Application Number:
JP2011532651A
Publication Date:
March 15, 2012
Filing Date:
October 23, 2009
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C14/34; H01L21/203
Domestic Patent References:
| JP2002155356A | 2002-05-31 | |||
| JP2008038250A | 2008-02-21 | |||
| JPH07228967A | 1995-08-29 | |||
| JP2009512777A | 2009-03-26 | |||
| JP2002515940A | 2002-05-28 | |||
| JP2011512457A | 2011-04-21 | |||
| JP2002519604A | 2002-07-02 | |||
| JPS53163352U | 1978-12-21 |
Foreign References:
| US20060278519A1 | 2006-12-14 | |||
| US5591314A | 1997-01-07 | |||
| WO2004085902A1 | 2004-10-07 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi