Title:
VACUUM DEVICE
Document Type and Number:
Japanese Patent JPS56142629
Kind Code:
A
Abstract:
PURPOSE:To enable continuous treatment in high vacuum by forming a slit, through which semiconductor wafers can pass, to a block connecting several vacuum chambers, the degree of vacuum thereof is increased by stages. CONSTITUTION:A slit 3A in an extent that semiconductor wafers 1 can pass is made up to a block 3 conneting several vacuum chambers, which have exhaust pipes and the degree of vacuum thereof is increased by stages, and the semiconductor wafers 1 are successively transported to the next vacuum chambers by means of O ring belts 2 (4 are O ring belt holes). Thus, the wafers 1 can continuously be sent into high vacuum chambers from atmospheric pressure without using vacuum valves.
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Inventors:
TSUMURA SUEO
Application Number:
JP4669080A
Publication Date:
November 07, 1981
Filing Date:
April 09, 1980
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
C23C16/44; C23C16/54; H01J37/317; H01L21/205; H01L21/265; H01L21/285; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/265; H01L21/285; H01L21/302; H01L21/31
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