CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGED PARTICLE BEAM DEVICE

Title:

CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGED PARTICLE BEAM DEVICE

Document Type and Number:

WIPO Patent Application WO/2010/140649

Kind Code:

A1

Abstract:

A charged particle beam device has a problem that charged particle beams deflect due to a disturbance in the symmetry of equipotential distribution in the vicinity of the outer peripheral edge of a sample to be evaluated. Electrode plates disposed in the interior of an electrostatic-adsorption sample holding mechanism comprise an inner electrode plate and an outer electrode plate, which are concentrically disposed. The outer diameter of the outer electrode plate is formed to a value larger than the outer diameter of the sample. Furthermore, the overlap surface area of the outer electrode plate and sample, and the surface area of the inner electrode plate are formed so as to have approximately equal size. Then, an optional voltage with a positive polarity relative to the reference voltage is applied to the inner electrode plate, and an optional voltage with a negative polarity relative to the reference voltage is applied to the outer electrode plate.

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Inventors:

KITSUNAI HIROYUKI (JP)
KANNO SEIICHIRO (JP)
MATSUSHIMA MASARU (JP)
NAKAGAWA SHUICHI (JP)
MIYA GO (JP)

Application Number:

PCT/JP2010/059421

Publication Date:

December 09, 2010

Filing Date:

June 03, 2010

Export Citation:

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Assignee:

HITACHI HIGH TECH CORP (JP)
KITSUNAI HIROYUKI (JP)
KANNO SEIICHIRO (JP)
MATSUSHIMA MASARU (JP)
NAKAGAWA SHUICHI (JP)
MIYA GO (JP)

International Classes:

H01J37/20; G01B15/00; H01L21/66; H01L21/683

Domestic Patent References:

WO2009157182A1

2009-12-30

Foreign References:

JP2001257158A	2001-09-21
JP2003142568A	2003-05-16
JPH11167892A	1999-06-22
JPH1167885A	1999-03-09
JPH06104164A	1994-04-15

Attorney, Agent or Firm:

ASAMURA PATENT OFFICE, p. c. (JP)
Patent business corporation Asamura patent firm (JP)

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