COMPOSITION FOR SEMICONDUCTOR PHOTORESIST, AND PATTERN FORMATION METHOD USING SAME

Title:

COMPOSITION FOR SEMICONDUCTOR PHOTORESIST, AND PATTERN FORMATION METHOD USING SAME

Document Type and Number:

WIPO Patent Application WO/2022/055149

Kind Code:

A1

Abstract:

The present invention relates to a composition for a semiconductor photoresist and a pattern formation method using same, the composition comprising a solvent and an organometallic compound represented by chemical formula 1. The details of chemical formula 1 are as defined in the specification.

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Inventors:

MOON KYUNGSOO (KR)
KANG EUNMI (KR)
KIM JAEHYUN (KR)
KIM JIMIN (KR)
KIM TAEHO (KR)
WOO CHANGSOO (KR)
CHEON HWANSUNG (KR)
CHAE SEUNGYONG (KR)
HAN SEUNG (KR)

Application Number:

PCT/KR2021/011121

Publication Date:

March 17, 2022

Filing Date:

August 20, 2021

Export Citation:

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Assignee:

SAMSUNG SDI CO LTD (KR)

International Classes:

G03F7/004; G03F7/025; G03F7/027; G03F7/20

Domestic Patent References:

WO2016065120A1

2016-04-28

Foreign References:

US20200117085A1	2020-04-16
KR20200033946A	2020-03-30
KR20200078518A	2020-07-01

Other References:

DEL RE RYAN; PASSARELLI JAMES; SORTLAND MIRIAM; CARDINEAU BRIAN; EKINCI YASIN; BUITRAGO ELIZABETH; NEISSER MARK; FREEDMAN DANIEL A: "Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates", JOURNAL OF MICRO/NANOLITHOGRAPHY, MEMS, AND MOEMS, SPIE - INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, US, vol. 14, no. 4, 1 October 2015 (2015-10-01), US , pages 043506 - 043506, XP060072342, ISSN: 1932-5150, DOI: 10.1117/1.JMM.14.4.043506
KENNEDY JOHN D., WILLIAM MCFARLANE, GEOFFREY S. PYNE, PETER L. CLARKE, JAMES L. WARDELL : "Magnetic Double Resonance Studies of Tin-I19 Chemical Shifts in Compounds with Tin-Sulphur Bonds and Related Species", JOURNAL OF THE CHEMICAL SOCIETY, PERKIN TRANSACTIONS 2, vol. 11, 1 January 1975 (1975-01-01), pages 1234 - 1239, XP055909886, DOI: 10.1039/P29750001234

Attorney, Agent or Firm:

PANKOREA PATENT AND LAW FIRM (KR)

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