Title:
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/244679
Kind Code:
A1
Abstract:
Provided is a technique that makes it possible to suppress collapse of a three dimensional structure. A substrate treatment method according to the present invention comprises a phosphoric acid treatment step (S13), a coarse rinsing treatment step (S15), and a sheet drying treatment step (S23). In the phosphoric acid treatment step (S13), a plurality of substrates are immersed in phosphoric acid in a treatment tank. In the coarse rinsing treatment step (S15), after the phosphoric acid treatment step (S13), a part of the phosphoric acid adhered to the plurality of substrates is replaced with a first rinsing liquid to the extent that the phosphoric acid remains in the pattern on each of the plurality of substrates. In the sheet drying treatment step (S23), after the coarse rinsing treatment step (S15), the plurality of substrates are dried one by one.
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Inventors:
MAGARA KEIJI (JP)
Application Number:
PCT/JP2022/020091
Publication Date:
November 24, 2022
Filing Date:
May 12, 2022
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Foreign References:
| JPH07211688A | 1995-08-11 | |||
| JP2020136444A | 2020-08-31 | |||
| JP2018093066A | 2018-06-14 | |||
| US20200203193A1 | 2020-06-25 | |||
| JP2021064654A | 2021-04-22 | |||
| JP2021064652A | 2021-04-22 | |||
| JP2016042503A | 2016-03-31 | |||
| JP2016502275A | 2016-01-21 | |||
| JP2020141063A | 2020-09-03 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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