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JP5549289B2 |
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JP5549288B2 |
When sulfinating a carboxylic acid bromofluoroalkyl ester by using a sulfinating agent, an organic base is used, thereby obtaining a fluoroalkanesulfinic acid ammonium salt. This is oxidized to obtain a fluoroalkanesulfonic acid ammonium...
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JP5543757B2 |
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JP5544151B2 |
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator compon...
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JP5542402B2 |
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JP5544212B2 |
A resist composition including a base material component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates acid upon exposure, the acid genera...
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JP5537998B2 |
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JP5538229B2 |
Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituen...
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JP5531138B2 |
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JP5531139B2 |
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JP5532593B2 |
To provide an ionic conductor exhibiting high ionic conductivity and to provide an electrochemical cell and a fuel cell to each of which the ionic conductor is applied. The ionic conductor comprises a cationic component and a polar subst...
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JP5522906B2 |
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JP5518280B2 |
A pharmaceutical composition comprising a compound of formula (1) in polymorphic crystalline Form A: together with a pharmaceutically acceptable carrier or excipient, wherein the compound of formula (1) is present in polymorphic Form A (...
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JP5520999B2 |
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JP5517811B2 |
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JP2014097989A |
To provide a novel crystalline form of 4-[6-acetyl-3-[3-(4-acetyl-3-hydroxy-2-propylphenylthio)prop
oxy]-2-propylphenoxy]butyric acid, useful for allergic disease such as bronchial asthma.In a pharmaceutical composition, at least about 9...
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JP5494714B2 |
The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in whi...
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JP5491913B2 |
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JP5493414B2 |
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JP5492395B2 |
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JP2014085515A |
To provide a resist composition capable of producing a resist pattern having excellent line width roughness (LWR).There is provided a resist composition containing a resin having a salt represented by the formula (I) and an acid-unstable...
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JP2014080370A |
To provide a sulfur-based pseudo acetal compound without requiring catalyst addition, catalyst removal, or catalyst production and with high selectivity and a high yield, and to provide a method for producing the same.In a method for pro...
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JP2014074803A |
To provide a coloring composition that has high coloring power and is suitable for forming a colored layer having high heat resistance and excellent chromaticity characteristics.A coloring composition contains (A) an acidic coloring agen...
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JP5480160B2 |
The present invention refers to using the principal of a room temperature molten ionic liquid, to an electrolyte, to devices comprising the ionic liquid co-melting, and to the preparation of a room temperature ionic liquid via various ph...
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JP5471363B2 |
A sulfonium salt has formula (1) wherein R1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R2, R3, and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur at...
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JP5473921B2 |
Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20al...
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JP5472217B2 |
A 2,2-bis(fluoroalkyl)oxirane (A) is prepared by reacting a fluorinated alcohol (1) with a chlorinating, brominating or sulfonylating agent under basic conditions to form an oxirane precursor (2) and subjecting the oxirane precursor to r...
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JP5474867B2 |
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JP5460230B2 |
A positive photosensitive composition includes at least one compound that when exposed to actinic rays or radiation, generates any of the sulfonic acids of general formula (I) and a resin whose solubility in an alkali developer is increa...
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JP5457785B2 |
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JP2014055154A |
To provide novel processes for producing arylsulfur pentafluorides in a safe, cost effective and timely fashion with excellent yields.Processes include reacting at least one arylsulfur compound with halogens and fluoro salt to form an ar...
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JP5453834B2 |
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JP5455358B2 |
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JP2014051452A |
To synthesize (3,5-bis-pentafluorosulfanyl-phenyl)-phthalocyanine.Introduc
tion of a substituent on the α position for suppression of aggregation increases a Lewis basicity of the imino nitrogen, resulting in easy decomposition. In this...
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JP5444702B2 |
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JP5446679B2 |
In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (a...
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JP5449276B2 |
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JP5447957B2 |
Novel processes for preparing arylsulfur pentafluorides are disclosed. Processes include reacting at least one aryl sulfur compound with a halogen and a fluoro salt to form an arylsufur halotetrafluoride. The arylsulfur halotetrafluoride...
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JP5439745B2 |
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JP2014040387A |
To provide a salt for an acid generator, which is used for a resist composition capable of producing a resist pattern excellent in pattern collapse margin (PCM).The salt is represented by formula (I). [In the formula (I), Q1 and Q2 each ...
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JP5434323B2 |
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JP5428159B2 |
A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-s...
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JP2014034519A |
To provide a method of producing a fullerene derivative which can be conducted at lower temperature.In a method of producing a fullerene derivative, salt and fullerene shown in the following formula are reacted with each other in the pre...
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JP5418226B2 |
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JP5411893B2 |
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JP5407203B2 |
A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as...
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JP5410093B2 |
A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R 1 re...
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JP5407866B2 |
A compound has a partial structure shown by a following formula (1), wherein R1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R2 represents a substituted or unsubstituted hydro...
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JP2014019646A |
To provide a liquid crystalline compound exhibiting high stability against heat, light or the like, high clearing point, low lower limit temperature of a liquid crystal phase, low viscosity, appropriate optical anisotropy, large dielectr...
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JP5401597B2 |
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