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JP6097568B2 |
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JP6095954B2 |
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JPWO2015064764A1 |
Provided is an allyloyl (oxy or amino) pentafluorosulfanilbenzene compound having a pharmacological action. The present invention relates to allyl (oxy or amino) pentafluorosulfanylbenzene compounds represented by the general formula (AI...
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JP6087977B2 |
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JP6086618B2 |
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JP6084988B2 |
The invention relates to sulfmimidoyl- and sulfonimidoylbenzoyl derivatives of the general formula (I). In said formula (I), R, R′, X, W and Z represent radicals such as hydrogen, organic radicals such as alkyl, and other radicals such...
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JP6079021B2 |
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JP6076029B2 |
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including: a base component (A) which exhibits changed solubility in a deve...
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JP6067031B2 |
The present invention relates to sulfonamide derivatives of formula (I): or a pharmaceutically acceptable salts thereof, wherein Z, R1a, R1b, R2, R3, R4 and R5 are as defined in the description, and to their use in medicine, to compositi...
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JP2017008068A |
To provide a new photoacid generator compound, a photoresist composition comprising the above compound, which forms an image with short wavelength radiation such as sub-300 nm and sub-200 nm radiation, and the photoacid generator compoun...
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JP6060024B2 |
To provide a resist composition in which a focus margin is good in production of a resist pattern, and which enables production of a resist pattern with less defects.A resist composition includes resin having a structural unit represente...
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JP2017002047A |
To provide a photoacid generator compound that does not cause decomposition products that can coat and corrode optic elements in chemically amplified photoresists for microelectronics applications.A photoacid generator compound has a com...
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JP6052280B2 |
A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group. R...
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JP6055666B2 |
A sulfonium salt compound represented by the following general formula (I): where R1 and R2 each denote the same or a different alkyl group having 1 to 18 carbon atoms, R3 and R4 each denote the same or a different alkyl group having 1 t...
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JP6049250B2 |
A photoacid generator compound has the formula (I): €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ G + Z-€ƒ€ƒ€ƒ€ƒ€ƒ(I) wherein G has the formula (II): wherein in formula (II), X is S or I, each R 0 is commonly attached to X and ...
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JP6046540B2 |
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JP6037994B2 |
A compound having the formula (I): wherein a is an integer of from 1 to 10, and x is an integer of from 1 to 3, X1 comprises a fluoroalcohol, fluorinated ester, or fluorinated anhydride, Y is a single bond, C1-20 alkylene group, O, S, NR...
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JP6038284B2 |
Compounds of the formula (I), (Ia) or (Ib) wherein A1, and A− is for example (II) is 1 or 2; X is C1-C4 alkylene or CO; Y is for example O, O(CO), O(CO)O, R1 is for example hydrogen, d-dsalkyl, C3-C30cycloalkyl, phenyl, naphthyl, anthr...
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JP6038297B2 |
and pharmaceutically acceptable salts thereof, wherein the variables RA, subscript n, ring A, X2, L, subscript m, X1, B, R1, R2, R3, R4, R5 and RN have the meaning as described herein, and compositions containing such compounds and metho...
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JP6037689B2 |
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JP6039194B2 |
The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which on...
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JP6034026B2 |
A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the acti...
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JP6027934B2 |
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JP6027822B2 |
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JP6021165B2 |
A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with ...
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JP6013218B2 |
The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid generator which is suitably used as an acid gene...
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JP6009729B2 |
A salt represented by the formula (I-CC): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each repres...
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JP6009730B2 |
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JP6011082B2 |
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JP6008205B2 |
Industrial methods for producing arylsulfur pentafluorides are disclosed. Methods include reacting arylsulfur halotetrafluoride with hydrogen fluoride in the absence or presence of one or more additives selected from a group of fluoride ...
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JP6010954B2 |
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JP6011095B2 |
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JP6009728B2 |
A salt represented by the formula (I-BB): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each repres...
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JP6007100B2 |
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JP6007011B2 |
To provide a compound useful for a resist composition, a resist composition containing the compound, and a method for forming a resist pattern by using the resist composition.The resist composition comprises a base component (A) showing ...
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JP6002509B2 |
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JP6002430B2 |
A resist composition including a base material component whose solubility in a developing solution changes by the action of an acid and an acid generator component which generates an acid upon exposure. The acid generator component inclu...
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JP5992930B2 |
The present invention relates to a heat-curable composition comprising (a) at least one compound which is capable of undergoing cationic polymerization; and (b) at least one sulfonium sulfate selected from compounds of the formulae Ia an...
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JP5993288B2 |
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JP5990262B2 |
The present invention relates to compounds containing hydrido-tricyano-borate anions, their preparation and their use, in particular as part of electrolyte formulations for electrochemical or optoelectronic devices.
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JP5980918B2 |
The invention relates to new compounds containing alkyl/alkenyl-cyano-borate or alkyl/alkenyl-cyano-fluoroborate anions, their preparation and their use, in particular as part of electrolyte formulations for electrochemical or optoelectr...
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JP5977560B2 |
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JP5978137B2 |
A resist composition including: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid generator component (B) that generates acid upon exposure, wh...
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JP2016147879A |
To provide photoacid generator compounds employing new photoresists that can provide highly resolved images of submicron dimensions.There is provided a compound of the formula in the figure that comprise: 1) a SOmoiety; 2) one or more fl...
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JP5969993B2 |
The invention relates to a novel process for the preparation of pan-CDK inhibitors of the formula (I), and intermediates of the preparation.
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JP5970966B2 |
A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A1 represents a C1-C30 monovalent organic group, X1 represents a C1-C10 aliphatic hydrocarbon group where ...
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JP5970926B2 |
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group m...
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JP5972765B2 |
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JP5972748B2 |
To provide a resist composition satisfying the shape of a resist pattern.A salt is represented by formula (I), wherein Qand Qare each independently a fluorine atom or a perfluoroalkyl group; Land Lare each independently a divalent satura...
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JP5973020B2 |
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