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JP2016006495A |
To provide a photo-destroyable quencher that exhibits increased dissolution stability and decreased hygroscopic properties relative to triphenylsulfonium phenolate, and a photoresist composition containing a photo-destroyable quencher ex...
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JP5835593B2 |
[Problem] To provide a novel silane compound and a composition for formation of a monolayer or a multilayer on a substrate. [Solution] A composition for formation of a monolayer or a multilayer containing a silane compound represented by...
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JPWO2013161394A1 |
The present invention is a method for producing trimethylsulfoxonium bromide by reacting dimethyl sulfoxide with methyl bromide (MeBr), in which MeBr is added so as to satisfy (1) and (2): (1) predetermined. MeBr is added at an addition ...
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JP5832370B2 |
To provide a novel ionic liquid which is flame retardant and has low volatility and expected to be used as an electrolyte for a lithium secondary cell etc.An ionic liquid includes an amide anion represented by general formula (1) (wherei...
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JP5828715B2 |
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JP5829795B2 |
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JP5830240B2 |
New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds ("PAGs") are provided as well as photoresist compositions that comprise such PAG compounds.
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JP5824823B2 |
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JP5821543B2 |
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JP5821582B2 |
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JP5816507B2 |
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JP5814072B2 |
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JP5810550B2 |
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JP5810097B2 |
The invention relates to a process for the preparation of salts having perfluoroalkyltricyano- or perfluoroalkylcyanofluoroborate anions, ((per)fluoro)phenyltricyano- or ((per)fluoro)phenylcyanofluoroborate anions, phenyltricyanoborate a...
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JP5809798B2 |
New photoacid generator compounds ("PAGs") are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
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JP5807334B2 |
A salt represented by the formula (I0): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a divalent C1-C17 hydrocarbon group in which one or more βCH2β can be replaced by β...
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JP5808902B2 |
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JP5798792B2 |
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JP5787720B2 |
The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represe...
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JP5783137B2 |
A sulfonium salt comprising (a) a polymerizable substituent, (b) a sulfonium cation, and (c) a sulfonate anion within a common molecule is capable of generating a sulfonic acid in response to high-energy radiation or heat. A resist compo...
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JP5774873B2 |
Liquid-crystalline compounds of the formula I in which R1, A1, A2, Z1, Z2, X, a, b, L1, L2 and L3 are as defined herein, and to liquid-crystalline media comprising at least one compound of the formula I and to electro-optical displays co...
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JP5767040B2 |
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JP5761583B2 |
Novel processes for preparing poly(pentafluorosulfanyl)aromatic compounds are disclosed. Processes include reacting an aryl sulfur compound with a halogen and a fluoro salt to form a poly(halotetrafluorosulfanyl)aromatic compound. The po...
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JP5756771B2 |
To provide a nonaqueous electrolytic solution excellent in initial capacity and capacity retainability (cycle characteristics).The electrolytic solution for a nonaqueous secondary battery contains a compound represented by formula (I) an...
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JP5752832B2 |
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JP5750346B2 |
The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which on...
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JP5750317B2 |
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JP5747311B2 |
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JP5749480B2 |
A compound represented by general formula (c1) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or a...
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JP5747450B2 |
A salt having a group represented by the formula (I): -Tββ(I) wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by βOβ or βSβ and which can have one or more substitu...
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JP5746836B2 |
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JP5742662B2 |
A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general form...
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JP5741289B2 |
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JP2015113284A |
To provide a sulfonium salt type cation generator capable of securing the electric corrosion resistance of an epoxy resin composition, and further having excellent low temperature hardenability, storage stability and UV hardenability, an...
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JP5732731B2 |
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JP5732306B2 |
There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently repres...
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JP5727316B2 |
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JP5727830B2 |
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JP5728916B2 |
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JP5723639B2 |
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JP5725041B2 |
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JP5723802B2 |
An actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the formula (Z1), and the formula (Z1) is defined as ...
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JP5721630B2 |
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JP5716744B2 |
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JP5717572B2 |
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JP5713006B2 |
The object of the present invention is to provide a novel thiosulfonate compound, a reversible cationization agent for protein and/or peptide, which can reversibly cationize a wider range of proteins and peptides with high stability of q...
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JP5712099B2 |
Provided is a resist composition, including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an a...
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JP5708663B2 |
A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R1 and R4 each independently represent a hydrogen atom, or the like. R2 ...
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JP5703702B2 |
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JP5704046B2 |
A sulfonate resin having a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R1 represents a hydrogen atom, a halogen atom, ...
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