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JP4465167B2 |
To provide a two-photon absorption foaming material which has a large non-resonance two-photon absorption cross-sectional area and generates gas by non-resonance two-photon absorption to form bubbles, and to provide a three dimensional i...
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JP4465180B2 |
To provide a non-resonance two-photon absorption material which yields high two-photon absorption efficiency in a wavelength region shorter than a wavelength twice as long as a linear absorption maximum wavelength. The non-resonance two-...
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JP4464396B2 |
A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is abo...
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JP4460864B2 |
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JP4461975B2 |
A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including ...
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JP2010515088A |
Optical storage layer comprises a photoaddressable polymer and an additive. Independent claims are also included for: (1) optical storage medium comprising a layer as above on a substrate; (2) optical security element comprising a layer ...
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JP2010095698A |
To provide a photosensitive composition for use in forming light shielding materials such as sunglasses or window panes, rewritable optical recording media such as film-like hologram elements or optical memories, and optical elements suc...
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JP2010096942A |
To provide an optical recording compound suitable for high-sensitive and large-capacity digital volume holography, an optical recording composition containing the compound, and a holographic recording medium allowing ultra-high density o...
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JP4459138B2 |
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JP4459149B2 |
The present invention provides a silver salt particle of a nitrogen-containing heterocyclic compound having a shape of A or B, and a photothermographic material including at least a photosensitive silver halide, a non-photosensitive orga...
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JP4457772B2 |
A silver salt photothermographic dry imaging material including a support provided thereon a light-sensitive layer containing an organic silver salt, light-sensitive silver halide particles and a reducing agent, wherein the dry imaging m...
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JP4459205B2 |
The present invention provides a black and white photothermographic material having, on at least one side of a support, at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for silver io...
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JP4456603B2 |
A composition comprising a polymer represented by the following formula (i), wherein the composition exhibits photorefractive ability: wherein R is selected from the group consisting of a linear alkyl group with up to 10 carbons, a branc...
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JP4456795B2 |
To provide a polymerizable composition that gives a photochromic polymer excellent in storage stability, and color density and fading speed in photochromicity. The polymerizable composition comprises a photochromic compound and a radical...
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JP4455029B2 |
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JP4452573B2 |
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JP4452188B2 |
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JP4452563B2 |
A positive resist composition satisfying high sensitivity, high resolution, good pattern profile and good in-vacuum PED property at the same time, and a pattern forming method using the composition, are provided, which is a positive resi...
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JP4449435B2 |
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JP4451763B2 |
A cross-linking polymer for an organic anti-reflective coating that is able to improve the uniformity of an ultra-fine photoresist pattern formed using a photolithography process and an ArF light source with 194 nm wavelength. Organic an...
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JP2010511265A |
The invention relates to a core-shell-type multilayer particle comprising at least one layer B that comprises at least one photoactive monomer bearing a photoisomerizable chromophore and a rigid shell A. The photoactive monomer has the f...
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JP2010511089A |
The present invention relates to a block copolymer comprising: at least a bloc A having a Tg>−60° C., preferably a Tg>0° C., and most preferably >60°B comprising at least one photoactive monomer having a photoisomerable chromophore....
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JP4446116B2 |
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JP4444060B2 |
A photosensitive resin composition for a black matrix comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) a solvent; and (E) a black pigment; wherein the alkali-soluble resin (A) comprises a...
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JP4442553B2 |
A method for separating photosensitive silver halide particles by precipitation from a dispersion comprising the silver halide particles and a protective colloid of a natural polymer, the method comprising the step of mixing the dispersi...
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JP4441369B2 |
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JP4441198B2 |
To provide a readily bondable polyester film having heat-sealability and excellent solvent resistance. The polyester film has a readily bondable layer formed by applying a mixture composed of (A) a hot-melt composition, (B) a water-solub...
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JP2010066214A |
To provide an apparatus for simply and correctly discriminating a material of a photographic film base which discriminates a tetraacetylcellulose (TAC) film.The apparatus includes: a pair of upper and lower holders 1, 3 openably coupled,...
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JP2010066315A |
To provide an inexpensive rewritable paper which can be repeatedly used many times and in which fixability and color developing property of a photochromic material are good.The rewritable paper is surface-coated with the inorganic photoc...
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JP4437942B2 |
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JP4437222B2 |
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JP4437981B2 |
The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a first reducing ...
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JP4437980B2 |
The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a first non-photosensitive organic silver salt, a reducing ...
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JP4434762B2 |
A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition...
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JP4431857B2 |
A microdevice (10) includes fluid supply passages (50, 52, 54) for allowing passage of fluid (L1-L3). The fluid supply passages are of a concentric multiple cylindrical construction to concentrically laminate the fluids joined together i...
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JP4433918B2 |
A method of forming an image comprising the steps of: (a) exposing a photothermographic material comprising a support having thereon an image forming layer comprising organic silver salt grains, silver halide grains, a reducing agent, a ...
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JP4435543B2 |
A radiographic imaging assembly comprises a radiographic silver halide film having a film speed of at least 100 and a single fluorescent intensifying screen that has a screen speed of at least 200. This imaging assembly is particularly u...
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JP4428642B2 |
It is disclosed an over-coating agent for forming fine-line patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is ...
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JP4429030B2 |
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JP4424933B2 |
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JP4426526B2 |
A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the inte...
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JP4420831B2 |
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JP4418714B2 |
A lithographic printing plate precursor comprising: a support; an undercoat layer; and an image recording layer containing a polymerization initiator, a polymerizable compound and an infrared ray absorbing agent, the image recording laye...
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JP4420774B2 |
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JP4420840B2 |
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JP4418819B2 |
Provided are an indicating material having excellent facility and high security and an indicating method for recording and indicating information on this indicating material. The indicating material has a structure that an ultraviolet li...
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JP4417675B2 |
A multi-photon absorber medium is of a predetermined thickness and contains multi-photon absorber material. The medium causes photo-reaction by multi-photon absorption upon receipt of light projected inward from one side. The reactivity ...
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JP4416941B2 |
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radi...
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JP4411102B2 |
A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upo...
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JP4411915B2 |
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