| Document |
Document Title |
|
JP4530273B2 |
|
|
JP2010181576A |
To downsize a recording device which records an image on an optical recording type display medium.In an electronic paper 200 which is the optical recording type display medium, inside a light shielding region of a casing 101, a display l...
|
|
JP4524774B2 |
It is an object of the present invention to provide a method for manufacturing a semiconductor device in which a desired region can be etched by evenly applying a solution including a resist and a method for manufacturing a semiconductor...
|
|
JP4526191B2 |
An optical recording material for binary, multibit or volume data storage is described. The optical recording material comprises: (a) at least one dyestuff selected from polymeric azo dyestuffs and oligomeric azo dyestuffs, the dyestuff ...
|
|
JP4525912B2 |
A chemically amplified resist composition using an alternating copolymer of alpha-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etch...
|
|
JP4528156B2 |
|
|
JP4523575B2 |
To provide a new structure having a structure constituted by dispersing a functional material of a nanometer size into a polymer, and to provide an optical recording medium in which recording and reproducing at the recording density exce...
|
|
JP4519206B2 |
|
|
JP4516963B2 |
A negative resist composition is disclosed, wherein the resist composition includes a polymer having at least one fluorosulfonamide monomer unit having one of the following two formulae: wherein: M is a polymerizable backbone moiety; Z i...
|
|
JP4512446B2 |
|
|
JP4512535B2 |
|
|
JP4514583B2 |
An organic anti-reflective coating composition and a method for forming a photoresist pattern using the same in order to improve uniformity of the pattern in an ultra-fine pattern formation process of the photoresist. In one aspect, orga...
|
|
JP4512818B2 |
|
|
JP4510759B2 |
The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslin...
|
|
JP2010160911A |
To provide a conductive material having excellent conductivity which hardly deteriorates conductivity by manufacturing a conductive material precursor and the conductive material using the conductive material precursor even though the co...
|
|
JP4508296B2 |
A method for minimizing coating defects caused by strikethrough when simultaneously slide coating a first fluid layer, a second fluid layer, and a third fluid layer. The method includes preparing the first, second, and third fluids such ...
|
|
JP4509638B2 |
A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)ac...
|
|
JP4505402B2 |
|
|
JP4500710B2 |
|
|
JP4500304B2 |
A method of forming a polymer device including the steps (i) of depositing on a substrate a solution containing a polymer or oligomer and a crosslinking moiety, to form a layer, and, (ii) curing the layer formed in step (i) under conditi...
|
|
JP4501451B2 |
A paint composition includes a raw polymer, and a dry solvent for dissolving the raw polymer. The raw polymer is composed of a transparent polymer having a hydroxyl group, and polysilazane. The polysilazane is included in an amount of 10...
|
|
JP4502115B2 |
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having a 7-oxanorbornane-2-carboxylic ester structure have resolution and provide a precise pattern profile and are useful in microfabrication usin...
|
|
JP4499259B2 |
|
|
JP4497886B2 |
|
|
JP4495815B2 |
|
|
JP4492827B2 |
The object of the present invention is a photochromic composition incorporating: + 2-(p-dimethylaminophenyl)-2-(p-methoxyphenyl)-5-methyl-7,9-d
imethoxy-[2H]-naphtho[1,2-b]pyran (compound (I)), and + 3-(p-methoxyphenyl)-3-phenyl-6-morpho...
|
|
JP4493938B2 |
A positive resist composition capable of improving the occurrence of standing waves on the side walls of a resist pattern, and a method of forming a resist pattern that uses such a positive resist composition. The positive resist composi...
|
|
JP4491283B2 |
The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the resist, and in addition, can be removed...
|
|
JP4490228B2 |
The present invention provides a resist pattern thickening material which can thicken a resist pattern and form a fine space pattern, exceeding exposure limits of exposure light used during patterning. The resist pattern thickening mater...
|
|
JP4488098B2 |
A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymeriz...
|
|
JP4489963B2 |
Described are articles having an aminoplast resin photochromic coating prepared from an aminoplast resin, component(s) having at least two different functional groups and photochromic substances. The coatings exhibit a Fischer microhardn...
|
|
JP4486819B2 |
The present invention provides oxazine compounds having aromatic, heteroaromatic, or aliphatic substituents at the 2 position of the oxazine moiety. Additionally, a one pot method with excellent yields is provided for producing the compo...
|
|
JP4484106B2 |
|
|
JP4484725B2 |
|
|
JP4484829B2 |
To provide an image sheet for transmitted light which can be easily handled and is excellent in incombustibility. The image sheet for transmitted light has a base layer 11 comprising a translucent sheet like body, a first image layer 12 ...
|
|
JP2010520516A |
Novel, developer soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along...
|
|
JP4476201B2 |
|
|
JP4478379B2 |
In a first aspect, organic coating compositions arc provided, particularly spin-on antireflective coating compositions, that contain a component such as a resin that comprises an aryl dicarhoxylate group. In a further aspect, organic coa...
|
|
JP4475432B2 |
To perform additional recording and rewriting recording of partial information to one recording layer without rerecording the whole of the recording layer in a layered waveguide type recording medium. In the layered waveguide type record...
|
|
JP4476882B2 |
A multicolored display and process for forming such a display is provided. The multicolored display includes marking particles comprising a mixture of photochromic materials. The photochromic materials each exhibit a first "invisible" ph...
|
|
JP2010122373A |
To reduce the light intensity of a laser beam required to form a recording mark.A recording layer 101 of an optical information recording medium 100 contains a two-photon absorbing material. This two-photon absorbing material is a metal ...
|
|
JP4473772B2 |
A reimageable medium for receiving an imaging light having a predetermined wavelength scope, the medium composed of: a substrate; a photochromic material capable of reversibly converting among a number of different forms, wherein one for...
|
|
JP4472922B2 |
A multilayer imageable article with at least two layers including a multiphoton imageable composition. The composition includes a multiphoton-sensitive photoactive system and at least one of a dye and a dye precursor. The photoactive sys...
|
|
JP4470330B2 |
|
|
JP4472880B2 |
To provide a bluing pigment composition for a white polyethylene coating material dry-laminated on the surface of a substrate that has good heat resistance, high coloring capability, wide range of color tone and good moldability. A bluin...
|
|
JP4473161B2 |
A silver halide photographic emulsion, wherein 70% or more of the total projected area of silver halide grains is occupied by silver halide grains satisfying the following requirements (a) to (d). (a) It is composed of a tabular silver h...
|
|
JP4474246B2 |
A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) ...
|
|
JP4469336B2 |
An information recording medium is provided that includes a recording portion (3), which is irradiated with a recording light or a reproducing light so that information is recorded or reproduced thereto or therefrom. The recording portio...
|
|
JP4469310B2 |
To provide a recording medium using phosphors and having high recording density and stabilized storage conditions, a recording apparatus for recording information in the recording medium, and a readout system for reading the information....
|
|
JP4469294B2 |
A silver halide emulsion, which is chemically sensitized by a compound of formula (1): wherein Ch represents a sulfur, selenium, or tellurium atom; X1 represents NR1 or N+(R2)R3Y-; R1 represents a hydrogen atom or a substituent; R2 and R...
|
