グラフトポリマーを含有する画像形成性エレメント

Japanese Patent JP2004525420

A

The present invention includes an imageable element, comprising a substrate and a thermally imageable composition which includes a graft copolymer having hydrophobic and hydrophilic segments. Upon imagewise exposure to thermal energy, the graft copolymer produces exposed regions that are less soluble in a developer than the unexposed regions. Also included is a method of producing an imaged element which includes a graft copolymer according to the present invention.

WO/1996/030452	WATER-BASE PHOTOSENSITIVE RESIN COMPOSITION
JP2005330369	COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION
JP5327310	A photosensitive resin composition, a photosensitive element using the photosensitive resin composition, a method for forming a resist pattern, and a method for manufacturing a printed wiring board.

S Peter Pappas
Shashkanto Saliya

JP2002579886A

August 19, 2004

January 23, 2002

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Kodak Polychrome Graphics LRC

G03F7/033; B41C1/10; B41M5/36; G03C1/498; G03C1/675; G03F7/004; G03F7/021; (IPC1-7): G03F7/033; G03C1/675; G03F7/004

Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
Shinya Mitsuhiro

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