Title:
MULTI-CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND BEAM EVALUATION METHOD OF THE SAME
Document Type and Number:
Japanese Patent JP2019220559
Kind Code:
A
Abstract:
To evaluate a beam oscillation in a multiple beam lithography apparatus.SOLUTION: A multi-charged particle beam lithography apparatus comprises: a molding aperture board forming a multiple beam by passing an electric charge particle beam through a plurality of first openings; a blanking aperture array mechanism which can switch ON/OFF of each beam of the multiple beam; an inspection aperture provided on a stage where a substrate of a drawing subject is mounted, and in which a second opening is provided so as to pass one beam of the multiple beam; a current inspector inspecting a current amount of the beam passing through the second opening of the inspection aperture; a deflector that deflects the multiple beam to deflect and control one beam of the multiple beam so as to be at a prescribed position of a region containing a circumference of the second opening; and an operation part for operating a beam position from the beam current inspected by the current inspector.SELECTED DRAWING: Figure 1
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Inventors:
FUJISAKI EITA
IIZUKA OSAMU
IIZUKA OSAMU
Application Number:
JP2018116294A
Publication Date:
December 26, 2019
Filing Date:
June 19, 2018
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC
International Classes:
H01L21/027; H01J37/244; H01J37/305
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Attorney, Agent or Firm:
Tsuyoshi Shigeno
Takayuki Shigeno
Takayuki Shigeno